SCHEMBL8945843

SCHEMBL8945843

CCNc1[c]ccc(NCC)c1

nearest known ligand 0.33

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
POLB P06746 1/20 0.33
HPGD P15428 1/20 0.33
CASP1 P29466 1/20 0.33
RECQL P46063 1/20 0.33
CASP7 P55210 1/20 0.33
HSD17B10 Q99714 1/20 0.33
LMNA P02545 1/20 0.32
ADRA2A P08913 1/20 0.32
ADRA2B P18089 1/20 0.32
ADRA2C P18825 1/20 0.32
AR P10275 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28269041 0.79 ALDH1A1 (0.31) ALDH1A1HPGDHSD17B10
SCHEMBL6491041 0.78 ALDH1A1 (0.38) MAPTKDM4EALDH1A1POLBHPGD
SCHEMBL4600055 0.78 POLB (0.31) POLB
SCHEMBL28419268 0.78 KDM4E (0.32) MAPTKDM4EALDH1A1HPGD
SCHEMBL4598926 0.78 GABRA1 (0.34)
SCHEMBL4600236 0.78 EGFR (0.34) MAPTKDM4EALDH1A1POLBHSD17B10
SCHEMBL8378491 0.73 MAPT (0.33) MAPTKDM4EALDH1A1POLBHPGD
SCHEMBL9739643 0.73 MAPT (0.37) MAPTKDM4EALDH1A1POLBHPGD
SCHEMBL4599560 0.71 MAPT (0.50) MAPTALDH1A1POLBHPGDLMNA
SCHEMBL20710 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102766100-A Method for preparing polysubstituted benzo[f]quinazoline derivative UNIV TSINGHUA 2012-11-07 CN disclosed
US-5580713-A EXHIBITS GREAT INTERIMAGE EFFECT AND SMALL DEPENDENCY ON CHANGES IN DEVELOPING PROCESS FACTORS FUJI PHOTO FILM CO., LTD. (JP) 1996-12-03 US disclosed
EP-0337370-B1 Silver halide photographic emulsion and silver halide photographic materials FUJI PHOTO FILM CO LTD (JP) 1996-10-09 EP disclosed
EP-0337490-B1 Silver halide light-sensitive photographic material FUJI PHOTO FILM CO LTD (JP) 1995-12-20 EP disclosed
US-5213942-A Reduced graininess without increased fog FUJI PHOTO FILM CO., LTD. (JP) 1993-05-25 US disclosed
US-5081009-A Non-prefogged grains FUJI PHOTO FILM CO., LTD. (JP) 1992-01-14 US disclosed
US-4952490-A LOW FOG; HIGH SPEED DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 1990-08-28 US disclosed
US-4952491-A LOW FOG AND HIGH SPECTRAL SENSITIVITY; RAPID PROCESSING; CRYSTAL HABIT CONTROL FUJI PHOTO FILM CO., LTD. (JP) 1990-08-28 US disclosed
EP-0337490-A2 Silver halide light-sensitive photographic material Fuji Photo Film Co., Ltd. (JP) 1989-10-18 EP disclosed
EP-0337370-A2 Silver halide photographic emulsion and silver halide photographic materials FUJI PHOTO FILM CO., LTD. (JP) 1989-10-18 EP disclosed
EP-0327066-A2 Direct positive photographic material FUJI PHOTO FILM CO., LTD. (JP) 1989-08-09 EP disclosed
EP-0127081-B1 COLOR REVERSAL PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1988-08-17 EP disclosed
US-4720451-A Silver halide color reversal light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1988-01-19 US disclosed
US-4626498-A Color reversal photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1986-12-02 US disclosed
EP-0127081-A2 Color reversal photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1984-12-05 EP disclosed