Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.32 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.31 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.30 |
| ▸ | TMPRSS15 | P98073 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL18140150 | 0.98 | TSHR (0.38) | TSHRALDH1A1ALOX15TDP1SMN1; SMN2 | |
| SCHEMBL27835777 | 0.88 | TSHR (0.39) | TSHRALDH1A1TDP1THRBTGFBR1 | |
| SCHEMBL5404107 | 0.83 | ALOX15 (0.38) | ALOX15TDP1SMN1; SMN2LMNASLC22A6 | |
| SCHEMBL721450 | 0.83 | ALDH1A1 (0.43) | TSHRALDH1A1ALOX15SMN1; SMN2LMNA | |
| SCHEMBL1408304 | 0.82 | THRB (0.41) | TSHRALDH1A1ALOX15SMN1; SMN2LMNA | |
| SCHEMBL5027499 | 0.82 | TGFBR1 (0.41) | TSHRALDH1A1THRBTGFBR1 | |
| SCHEMBL4642191 | 0.82 | TSHR (0.41) | TSHRALDH1A1SMN1; SMN2THRBTGFBR1 | |
| SCHEMBL20952184 | 0.80 | MGAM (0.41) | TSHRALDH1A1ALOX15TDP1LMNA | |
| SCHEMBL1828772 | 0.80 | ALOX15 (0.36) | ALOX15TDP1SMN1; SMN2LMNASLC22A6 | |
| SCHEMBL29011788 | 0.80 | TSHR (0.39) | TSHRALDH1A1SMN1; SMN2THRBTGFBR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 128 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110806676-A | Photosensitive resin composition and application thereof | 常州强力先端电子材料有限公司 | 2020-02-18 | — | — | CN | claimed |
| US-4065423-A | Paper coating latex compositions containing copolymers of monovinylidene aromatic monomer, aliphatic conjugated diene and an aryloyloxycarboxylic acid monomer | UNIROYAL, INC. (US) | 1977-12-27 | — | — | US | claimed |
| CN-119902413-A | Photosensitive coloring resin composition, color filter, manufacturing method thereof and liquid crystal display device | 奇美实业股份有限公司 | 2025-04-29 | — | — | CN | disclosed |
| CN-119126423-A | Method for manufacturing color filter, and liquid crystal display device | 奇美实业股份有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-119126285-A | Method for manufacturing color filter, and liquid crystal display device | 奇美实业股份有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-119105240-A | Pixel forming method, pixel, color filter and display device | 奇美实业股份有限公司 | 2024-12-10 | — | — | CN | disclosed |
| EP-3265046-B1 | STABILIZED CALCIUM PHOSPHATE AND METHODS OF FORMING SAME | Modern Ideas LLC (US) | 2024-09-04 | — | — | EP | disclosed |
| US-12066645-B2 | Retroreflective sheet | KIWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2024-08-20 | — | — | US | disclosed |
| CN-114008492-B | Retroreflective sheeting | 纪和化学工业株式会社 | 2024-07-26 | — | — | CN | disclosed |
| WO-2024048354-A1 | CARBON NANOTUBE DISPERSION, SLURRY COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY ELECTRODE, ELECTRODE FOR NONAQUEOUS SECONDARY BATTERY, AND NONAQUEOUS SECONDARY BATTERY | 日本ゼオン株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024004834-A1 | SEPARATOR FOR NONAQUEOUS SECONDARY BATTERY, AND NONAQUEOUS SECONDARY BATTERY | 日本ゼオン株式会社 | 2024-01-04 | — | — | WO | disclosed |
| US-5580995-A | Process for preparing anhydride-functional monomers | THE SHERWIN-WILLIAMS COMPANY (US) | 1996-12-03 | — | — | US | disclosed |
| US-5527662-A | DEPOSITING RESIST FILM CONTAINING (METHYLOL)MELAMINE, A PHOTO ACID GENERATOR AND AN ELECTROCONDUCTIVE POLYMER ON SEMICONDUCTOR SUBSTRATE, THEN HEATING, EXPOSURE TO RADIATION BEAM AND MORE HEATING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-06-18 | — | — | US | disclosed |
| US-5364945-A | Anhydride-functional monomers and polymers and reactive compositions prepared from same | THE SHERWIN-WILLIAMS COMPANY (US) | 1994-11-15 | — | — | US | disclosed |
| US-5316891-A | Fine pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-05-31 | — | — | US | disclosed |
| US-5252430-A | Fine pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1993-10-12 | — | — | US | disclosed |
| US-5198326-A | Process for forming fine pattern | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1993-03-30 | — | — | US | disclosed |
| US-5141789-A | Base member with water soluble polymer layer on reverse and release member with pressure sensitive adhesive layer between them | KANZAKI PAPER MANUFACTURING CO., LTD. (JP) | 1992-08-25 | — | — | US | disclosed |
| US-5104929-A | With a protic group-substituted ester or amide of acrylic or methacrylic acid; curable; transparent; durable | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-04-14 | — | — | US | disclosed |
| EP-0337695-A2 | Abrasion resistant coatings comprising silicon dioxide dispersions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-10-18 | — | — | EP | disclosed |