SCHEMBL8959192

SCHEMBL8959192

COc1c(O)ccc(Cc2ccc(O)c(OC)c2-c2cc(C)c(O)c(C)c2)c1-c1cc(C)c(O)c(C)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
AMY1A P0DUB6 1/20 0.38
MGAM O43451 3/20 0.37
GAA P10253 3/20 0.37
SI P14410 3/20 0.37
MGAM2 Q2M2H8 3/20 0.37
MAOA P21397 1/20 0.37
FYN P06241 2/20 0.36
PDE4B Q07343 3/20 0.36
PDE4A P27815 2/20 0.36
PDE4C Q08493 2/20 0.36
PDE4D Q08499 2/20 0.36
ESR1 P03372 2/20 0.36
ESR2 Q92731 2/20 0.36
ALOX5 P09917 2/20 0.35
PTGS1 P23219 1/20 0.35
PTGS2 P35354 1/20 0.35
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28807872 0.83 CA1 (0.46) CA1CA2AMY1AGAAESR1
SCHEMBL19596581 0.70 CA1 (0.67) CA1CA2FYNPDE4BPDE4A
SCHEMBL8043644 0.68 PDE4B (0.46) CA1CA2MGAMGAASI
SCHEMBL27981275 0.67 CA1 (0.54) CA1CA2GAAFYNESR2
SCHEMBL5528708 0.67 CA1 (0.54) CA1CA2GAAFYNALOX5
SCHEMBL28294685 0.67 MGAM (0.49) MGAMGAASIMGAM2MAOA
SCHEMBL11750586 0.67 MAOA (0.43) CA1CA2MGAMGAASI
SCHEMBL29719141 0.66 GABRA1 (0.46) CA1CA2MAOAESR1ESR2
SCHEMBL17008599 0.66 KDM4E (0.39) CA1CA2GAAMAOAPDE4B
SCHEMBL18780425 0.66 SHBG (0.52) CA1CA2ESR1ESR2ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5494785-A High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns OCG MICROELECTRONIC MATERIALS, INC. (US) 1996-02-27 US disclosed
US-5473045-A Two-step process; first noncatalyzed reaction of phenolic monomer with aldehyde source, then chain extension OCG MICROELECTRONIC MATERIALS, INC. (US) 1995-12-05 US disclosed
US-5413894-A Positive-working photoresists also containing o-quinonediazide photosensitizers OCG MICROELECTRONIC MATERIALS, INC. (US) 1995-05-09 US disclosed
EP-0623633-A2 High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions OCG MICROELECTRONIC MATERIALS, INC. (US) 1994-11-09 EP disclosed