SCHEMBL8965194

SCHEMBL8965194

C=Cc1ccc(C(=O)C(C#N)=Cc2ccc(N3CCOCC3)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 9/20 0.56
MEN1 O00255 7/20 0.56
ALDH1A1 P00352 11/20 0.53
MAPT P10636 10/20 0.53
NPC1 O15118 4/20 0.53
RAB9A P51151 4/20 0.53
SMN1; SMN2 Q16637 4/20 0.53
LMNA P02545 1/20 0.53
TDP1 Q9NUW8 2/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
MAPK1 P28482 1/20 0.46
CASP3 P42574 1/20 0.46
SENP8 Q96LD8 1/20 0.46
SENP7 Q9BQF6 1/20 0.46
SENP6 Q9GZR1 1/20 0.46
KDM4E B2RXH2 2/20 0.45
PKM P14618 1/20 0.45
ATM Q13315 1/20 0.45
APP P05067 1/20 0.45
MITF O75030 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9644231 0.89 KMT2A (0.58) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL8965228 0.89 KMT2A (0.58) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL9644237 0.89 KMT2A (0.58) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL17120618 0.80 MEN1 (0.65) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL12306023 0.78 MEN1 (0.62) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL8965772 0.77 ALDH1A1 (0.54) KMT2AMEN1ALDH1A1MAPTSMN1; SMN2
SCHEMBL2904812 0.76 ALDH1A1 (0.54) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL12435542 0.74 ALDH1A1 (0.80) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL8965459 0.74 KMT2A (0.76) KMT2AMEN1ALDH1A1MAPTRAB9A
SCHEMBL1009547 0.73 KMT2A (1.00) KMT2AMEN1ALDH1A1MAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed