Methacrylic Acid

Methacrylic Acid

SCHEMBL8965210

C=C(C(=O)O)C(C1CCCCCCCCC1)(C1CCCCCCCCC1)C1CCCCCCCCC1.C=C(C)C(=O)O.C=C(C)C(=O)OCC1CO1.C=CC(=O)Oc1ccc(C(=O)C=Cc2ccc(OC)cc2)cc1

nearest known ligand 0.39

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F3 P13726 2/20 0.39
XDH P47989 2/20 0.38
BCHE P06276 2/20 0.38
MAOB P27338 9/20 0.37
MAPT P10636 5/20 0.37
ALDH1A1 P00352 4/20 0.37
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
CYP1B1 Q16678 2/20 0.37
HSPD1 P10809 1/20 0.37
TNFRSF1A P19438 1/20 0.37
HSPE1 P61604 1/20 0.37
CYP3A4 P08684 1/20 0.37
NFKB1 P19838 1/20 0.37
NFKB2 Q00653 1/20 0.37
RELA Q04206 1/20 0.37
MAOA P21397 3/20 0.36
RAB9A P51151 2/20 0.36
P4HB P07237 1/20 0.36
CALM1 P0DP23 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965374 0.84 F3 (0.44) F3XDHBCHEMAOBMAPT
Methacrylic Acid SCHEMBL8965245 0.81 TNFRSF1A (0.43) MAPTALDH1A1MEN1KMT2ATNFRSF1A
SCHEMBL8965834 0.79 TNFRSF1A (0.45) MAPTALDH1A1MEN1KMT2ATNFRSF1A
Methacrylic Acid SCHEMBL8965877 0.77 MAOB (0.40) BCHEMAOBMAPTALDH1A1MAOA
Methacrylic Acid SCHEMBL8965253 0.76 ALDH1A1 (0.45) MAPTALDH1A1MEN1KMT2ARAB9A
Acrylic Acid SCHEMBL8964933 0.69 MAOB (0.46) F3XDHBCHEMAOBMAPT
SCHEMBL3440624 0.69 MAOB (0.67) F3XDHBCHEMAOBMAPT
SCHEMBL3440623 0.69 MAOB (0.67) F3XDHBCHEMAOBMAPT
SCHEMBL10954169 0.69 F3 (0.73) F3XDHBCHEMAOBMAPT
SCHEMBL6330064 0.69 F3 (0.73) F3XDHBCHEMAOBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed