SCHEMBL8970628

SCHEMBL8970628

Cc1ccccc1S(=O)(=O)OCc1ccc([N+](=O)[O-])cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 2/20 0.48
MMP2 P08253 2/20 0.48
MMP9 P14780 2/20 0.48
MMP8 P22894 2/20 0.48
MMP13 P45452 2/20 0.48
IDO1 P14902 2/20 0.47
LMNA P02545 1/20 0.47
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA7 P43166 1/20 0.45
CA9 Q16790 1/20 0.45
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
HTT P42858 1/20 0.43
AKR1C3 P42330 1/20 0.43
CYP19A1 P11511 2/20 0.42
RAB9A P51151 1/20 0.42
BCHE P06276 1/20 0.42
ACHE P22303 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dinitrophenylene SCHEMBL27773335 0.87 AR (0.46) LMNAMEN1KMT2ACYP19A1ACHE
SCHEMBL18045535 0.86 MMP1 (0.47) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6899893 0.83 CA2 (0.52) CA1CA2CA9MEN1KMT2A
SCHEMBL28296023 0.82 ALDH1A1 (0.45) MEN1KMT2AHTTALDH1A1PDE2A
SCHEMBL8400160 0.81 MEN1 (0.53) IDO1LMNACA12CA1CA2
SCHEMBL5136631 0.80 ALDH1A1 (0.45) MEN1KMT2AHTTRAB9AALDH1A1
SCHEMBL21140317 0.80 IDO1 (0.44) IDO1LMNACA12CA1CA2
SCHEMBL18045522 0.79 POLB (0.55) MMP1MMP2MMP9MMP8MMP13
SCHEMBL197968 0.79 ACHE (0.57) IDO1CA12CA1CA2CA7
SCHEMBL27724423 0.79 HTT (0.55) MMP2IDO1LMNACA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240210832-A1 PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-06-27 US disclosed
CN-110950781-A Novel diamine, polyamic acid, and polyimide 日产化学工业株式会社 2020-04-03 CN disclosed
US-10023530-B2 Diamine, polyamic acid, and polyimide NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-07-17 US disclosed
CN-108122830-A Method for forming semiconductor device 台湾积体电路制造股份有限公司 2018-06-05 CN disclosed
US-20160264520-A1 NOVEL DIAMINE, POLYAMIC ACID, AND POLYIMIDE NISSAN CHEMICAL INDUSTRIES. LTD. (JP) 2016-09-15 US disclosed
CN-105683155-A Novel diamine, polyamic acid, and polyimide 日产化学工业株式会社 2016-06-15 CN disclosed
CN-102630246-B Anti-reflective coating composition and process MERCK PATENT GMBH (DE) 2016-05-11 CN disclosed
CN-102741753-B Antireflective compositions and methods of using same AZ ELECTRONIC MATERIALS USA CORP. (US) 2014-10-29 CN disclosed
CN-103353706-A Antireflective coating compositions AZ ELECTRONIC MATERIALS USA 2013-10-16 CN disclosed
CN-101529336-B Antireflective coating composition AZ ELECTRONIC MATERIALS USA 2013-08-21 CN disclosed
CN-101583907-A Solvent mixture for antireflective coating composition for photoresist AZ ELECTRONIC MATERIALS USA (US) 2009-11-18 CN disclosed
CN-101529336-A Antireflective coating composition AZ ELECTRONIC MATERIAL USA COR (US) 2009-09-09 CN disclosed
CN-101529335-A Antireflective coating compositions AZ ELECTRONIC MATERIALS USA (US) 2009-09-09 CN disclosed
CN-101027610-A Antireflective composition for photoresists AZ ELECTRONIC MATERIALS USA (US) 2007-08-29 CN disclosed
CN-1951997-A Electric field programmable films and memory device based thereon ROHM & HAAS ELECT MAT (US) 2007-04-25 CN disclosed
CN-1901092-A Device comprising multiple bit data ROHM & HAAS ELECT MAT (US) 2007-01-24 CN disclosed
CN-1714316-A Antireflective compositions for photoresists AZ ELECTRONIC MATERIALS USA (US) 2005-12-28 CN disclosed
CN-1215381-C Antireflective composition for deep ultraviolet photoresist AZ ELECTRONIC MATERIAL CO LTD (JP) 2005-08-17 CN disclosed
CN-1330779-A Antireflective composition for deep ultraviolet photoresist CLARIANT INT LTD (CH) 2002-01-09 CN disclosed
US-5563022-A MIXTURE OF WATER INSOLUBLE ORGANIC BINDER HAVING ACID-LABILE ETHER, ESTER OR CARBONATE GROUPS OR BEING SOLUBLE IN ALKALINE SOLUTIONS, ORGANIC COMPOUND WHOSE SOLUBILITY IS INCREASED BY ACID, ARYLSULFONIC ESTER BASF AKTIENGESELLSCHAFT (DE) 1996-10-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10023530-B2 Diamine, polyamic acid, and polyimide H1-2, H1-4, H1-0 MMP1 3526/4885MMP2 3145/4885MMP9 4362/4885
US-20160264520-A1 NOVEL DIAMINE, POLYAMIC ACID, AND POLYIMIDE H1-4, H1-2, H1-5 MMP1 3817/4885MMP2 3341/4885MMP9 4475/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.