Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL19924291 | 1.00 | — | — | |
| Water SCHEMBL18044802 | 0.82 | — | — | |
| Water SCHEMBL21956078 | 0.82 | — | — | |
| Water SCHEMBL15577110 | 0.82 | — | — | |
| Water SCHEMBL11655347 | 0.82 | — | — | |
| Water SCHEMBL9559511 | 0.82 | — | — | |
| Water SCHEMBL26332 | 0.82 | — | — | |
| Water SCHEMBL22749398 | 0.82 | — | — | |
| Water SCHEMBL1711800 | 0.82 | — | — | |
| Water SCHEMBL4581159 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230298904-A1 | ELECTRON EXCITATION ATOMIC LAYER ETCH | LAM RES CORP (US) | 2023-09-21 | — | — | US | claimed |
| US-20230298904-A1 | ELECTRON EXCITATION ATOMIC LAYER ETCH | LAM RES CORP (US) | 2023-09-21 | — | — | US | disclosed |
| CN-116525388-A | Graphene needle tip modified by low work function material and preparation method thereof | 国家纳米科学中心 | 2023-08-01 | — | — | CN | disclosed |
| US-11637022-B2 | Electron excitation atomic layer etch | LAM RESEARCH CORPORATION (US) | 2023-04-25 | — | — | US | disclosed |
| US-11161987-B2 | Mixed transition metal oxides silica xerogels as antifouling/fouling release surfaces | THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK (US) | 2021-11-02 | — | — | US | disclosed |
| US-20210280433-A1 | ELECTRON EXCITATION ATOMIC LAYER ETCH | LAM RESEARCH CORPORATION (US) | 2021-09-09 | — | — | US | disclosed |
| EP-3821457-A1 | ELECTRON EXCITATION ATOMIC LAYER ETCH | Lam Research Corporation (US) | 2021-05-19 | — | — | EP | disclosed |
| CN-110666123-B | Method for enhancing heat resistance and wear resistance of withdrawal and straightening roller of continuous casting machine and withdrawal and straightening roller obtained by method | 燕山大学 | 2021-03-19 | — | — | CN | disclosed |
| CN-112424914-A | Electronically stimulated atomic layer etching | 朗姆研究公司 | 2021-02-26 | — | — | CN | disclosed |
| CN-110666123-A | Method for enhancing heat resistance and wear resistance of withdrawal and straightening roller of continuous casting machine and withdrawal and straightening roller obtained by method | 燕山大学 | 2020-01-10 | — | — | CN | disclosed |
| US-20180362778-A1 | MIXED TRANSITION METAL OXIDES SILICA XEROGELS AS ANTIFOULING/FOULING RELEASE SURFACES | THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK (US) | 2018-12-20 | — | — | US | disclosed |
| WO-2017100629-A1 | MIXED TRANSITION METAL OXIDES SILICA XEROGELS AS ANTIFOULING/FOULING RELEASE SURFACES | THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK (US) | 2017-06-15 | — | — | WO | disclosed |
| CN-103943437-B | A kind of field-emission electron emission source emitter tip forming devices and shaping method thereof | 北京大学 | 2017-01-04 | — | — | CN | disclosed |
| CN-104134604-B | A kind of field emitting electronic source electron beam emitting performance evaluating apparatus and evaluating method thereof | 北京大学 | 2016-10-05 | — | — | CN | disclosed |
| US-20140253137-A1 | TEST PATTERN DESIGN FOR SEMICONDUCTOR DEVICES AND METHOD OF UTILIZING THEREOF | MACRONIX INTERNATIONAL CO., LTD. (TW) | 2014-09-11 | — | — | US | disclosed |
| EP-0585840-B1 | Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens | TOSHIBA KK (JP) | 1996-10-16 | — | — | EP | disclosed |
| US-5498874-A | Defect detecting apparatus and method | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-03-12 | — | — | US | disclosed |
| US-5371371-A | Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-12-06 | — | — | US | disclosed |
| US-5362968-A | Optic column having particular major/minor axis magnification ratio | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0585840-A1 | Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-03-09 | — | — | EP | disclosed |