SCHEMBL9002510

SCHEMBL9002510

Cc1ccc(O)c(-n2n3c4ccccc4n23)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 5/20 0.53
▸ NPC1 O15118 1/20 0.53
▸ RAB9A P51151 1/20 0.53
▸ TRPA1 O75762 1/20 0.43
▸ TP53 P04637 2/20 0.42
▸ TDP1 Q9NUW8 2/20 0.42
▸ ALOX15 P16050 4/20 0.39
▸ HSD17B10 Q99714 3/20 0.39
▸ ALDH1A1 P00352 3/20 0.39
▸ FTO Q9C0B1 1/20 0.39
▸ HPGD P15428 4/20 0.38
▸ GAA P10253 4/20 0.38
▸ MEN1 O00255 4/20 0.38
▸ KMT2A Q03164 4/20 0.38
▸ MAPT P10636 4/20 0.38
▸ ALOX12 P18054 1/20 0.38
▸ GFER P55789 1/20 0.38
▸ CSNK2A1 P68400 1/20 0.36
▸ KCNMA1 Q12791 1/20 0.36
▸ POLB P06746 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14354914 0.85 TRPA1 (0.43) LMNANPC1RAB9ATRPA1TP53
SCHEMBL9002294 0.85 LMNA (0.43) LMNANPC1RAB9ATRPA1ALOX15
SCHEMBL9069078 0.78 LMNA (0.39) LMNANPC1RAB9ATP53TDP1
SCHEMBL9002493 0.77 ALDH1A1 (0.48) LMNANPC1RAB9ATDP1ALOX15
SCHEMBL10453380 0.77 KMT2A (0.43) LMNANPC1RAB9ATP53TDP1
SCHEMBL29788009 0.76 LMNA (0.51) LMNANPC1RAB9ATRPA1TP53
SCHEMBL13045186 0.76 LMNA (0.51) LMNANPC1RAB9ATRPA1TP53
SCHEMBL9906590 0.76 KCNMA1 (0.46) LMNANPC1RAB9ATDP1ALOX15
SCHEMBL19376980 0.75 LMNA (0.50) LMNANPC1RAB9ATRPA1TP53
SCHEMBL14529481 0.74 LMNA (0.49) LMNANPC1RAB9ATRPA1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11862504-B2 Mask-integrated surface protective tape, and method of producing a semiconductor chip using the same FURUKAWA ELECTRIC CO., LTD. (JP) 2024-01-02 — — US disclosed
US-10272708-B2 Thermosensitive recording material and method for manufacturing the same FUJIFILM CORPORATION (JP) 2019-04-30 — — US disclosed
US-20180043717-A1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2018-02-15 — — US disclosed
US-20180043717-A1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2018-02-15 — — US disclosed
US-9726932-B2 Optical film, optical compensation film, polarizing plate and liquid crystal display FUJIFILM CORPORATION (JP) 2017-08-08 — — US disclosed
US-9726932-B2 Optical film, optical compensation film, polarizing plate and liquid crystal display FUJIFILM CORPORATION (JP) 2017-08-08 — — US disclosed
US-20160231606-A1 OPTICAL FILM, OPTICAL COMPENSATION FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY FUJIFILM CORPORATION (JP) 2016-08-11 — — US disclosed
US-20160231606-A1 OPTICAL FILM, OPTICAL COMPENSATION FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY FUJIFILM CORPORATION (JP) 2016-08-11 — — US disclosed
US-9354356-B2 Polymer film, and optically-compensatory film, polarizer and liquid-crystal display device comprising the same FUJIFILM CORPORATION (JP) 2016-05-31 — — US disclosed
US-9354356-B2 Polymer film, and optically-compensatory film, polarizer and liquid-crystal display device comprising the same FUJIFILM CORPORATION (JP) 2016-05-31 — — US disclosed
US-7183044-B2 Silver halide color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2007-02-27 — — US disclosed
US-20070040962-A1 Optical resin film and polarizing plate and liquid crystal display using same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-22 — — US disclosed
US-7176162-B2 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2007-02-13 — — US disclosed
US-20070032381-A1 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2007-02-08 — — US disclosed
US-20070032381-A1 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2007-02-08 — — US disclosed
US-7172856-B2 Silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2007-02-06 — — US disclosed
US-7163783-B2 Rinse-processing composition for processing silver halide color photographic material, processing apparatus and processing method FUJI PHOTO FILM CO., LTD. (JP) 2007-01-16 — — US disclosed
US-7160840-B2 Thermal recording material FUJI PHOTO FILM CO., LTD. (JP) 2007-01-09 — — US disclosed
US-7160840-B2 Thermal recording material FUJI PHOTO FILM CO., LTD. (JP) 2007-01-09 — — US disclosed
US-20070004594-A1 Heat-sensitive recording material and heat-sensitive recording method FUJI PHOTO FILM CO., LTD. 2007-01-04 — — US disclosed
Send feedback