SCHEMBL9003754

SCHEMBL9003754

O=C(CS(O[Cl+3]([O-])([O-])[O-])(c1ccccc1)c1ccccc1)c1ccc(F)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 7/20 0.58
ALDH1A1 P00352 3/20 0.41
HTR2A P28223 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
KDM4E B2RXH2 1/20 0.41
HTR2C P28335 1/20 0.41
KCNH2 Q12809 1/20 0.41
DRD2 P14416 1/20 0.40
LMNA P02545 1/20 0.40
MAPK1 P28482 1/20 0.40
CASP3 P42574 1/20 0.40
SENP7 Q9BQF6 1/20 0.40
SENP6 Q9GZR1 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA4 P22748 1/20 0.39
CA9 Q16790 1/20 0.39
TAS2R14 Q9NYV8 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9003676 0.90 RECQL (0.46) HSD11B1ALDH1A1L3MBTL1KDM4ELMNA
SCHEMBL8752339 0.86 HSD11B1 (0.58) HSD11B1ALDH1A1L3MBTL1LMNAMAPK1
SCHEMBL28888270 0.74 HSD11B1 (1.00) HSD11B1ALDH1A1L3MBTL1KDM4EMAPK1
SCHEMBL28392126 0.71 HSD11B1 (0.87) HSD11B1ALDH1A1KDM4EMEN1KMT2A
SCHEMBL3140974 0.70 PKM (0.42) HSD11B1ALDH1A1MAPK1MEN1KMT2A
SCHEMBL3139597 0.70 PKM (0.42) HSD11B1ALDH1A1MAPK1MEN1KMT2A
SCHEMBL9626702 0.67 HSD11B1 (0.51) HSD11B1ALDH1A1KDM4EMAPK1MEN1
SCHEMBL8074584 0.67 HSD11B1 (0.62) HSD11B1ALDH1A1LMNAMEN1KMT2A
SCHEMBL10731900 0.66 MEN1 (0.74) HSD11B1ALDH1A1KDM4ELMNAMAPK1
SCHEMBL4485908 0.66 RAB9A (0.69) HSD11B1ALDH1A1L3MBTL1KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed