SCHEMBL9006596

SCHEMBL9006596

CC(=O)c1ccc(OC(F)(F)C(F)(F)Br)cc1

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.53
HPGD P15428 1/20 0.53
RAB9A P51151 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.47
MAOB P27338 9/20 0.46
GAA P10253 1/20 0.46
STS P08842 1/20 0.44
MAOA P21397 1/20 0.44
LMNA P02545 2/20 0.43
POLB P06746 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42
KDM4E B2RXH2 1/20 0.42
TSHR P16473 2/20 0.41
ESRRA P11474 1/20 0.41
GLA P06280 1/20 0.41
KMT2A Q03164 1/20 0.41
ALDH1A1 P00352 2/20 0.40
HSD17B10 Q99714 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2091503 0.87 MAPT (0.55) MAPTHPGDRAB9AL3MBTL1MAOB
SCHEMBL5312032 0.85 PPARG (0.45) MAPTHPGDRAB9ASTSLMNA
SCHEMBL9173852 0.83 PARP10 (0.55) MAOBKMT2AALDH1A1
SCHEMBL9171619 0.83 TSHR (0.57) TSHRKMT2AALDH1A1HSD17B10
SCHEMBL75853 0.82 RAB9A (0.59) MAPTHPGDRAB9AL3MBTL1MAOB
SCHEMBL5325355 0.82 CA1 (0.56) MAPTRAB9ASTSLMNAKDM4E
SCHEMBL9172265 0.81 ALDH1A1 (0.40) RAB9ATSHRKMT2AALDH1A1HSD17B10
SCHEMBL9171972 0.81 LMNA (0.52) MAPTGAALMNAPOLBNPSR1
SCHEMBL16168494 0.81 MAPT (0.57) MAPTHPGDRAB9AL3MBTL1MAOB
SCHEMBL25175292 0.78 RAB9A (0.70) MAPTHPGDRAB9AL3MBTL1MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed