SCHEMBL9006789

SCHEMBL9006789

O=C(C=Cc1ccc(OC(F)=C(F)F)cc1)C=Cc1ccc(C(=O)O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
XDH P47989 1/20 0.51
F3 P13726 4/20 0.49
HSD11B1 P28845 2/20 0.45
KMT2A Q03164 2/20 0.44
APP P05067 1/20 0.44
CYP2D6 P10635 3/20 0.43
CYP1A2 P05177 3/20 0.43
CYP2C9 P11712 2/20 0.43
ALDH1A1 P00352 2/20 0.43
MAPT P10636 2/20 0.43
PLIN1 O60240 1/20 0.43
LMNA P02545 1/20 0.43
RECQL P46063 1/20 0.43
PLIN5 Q00G26 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
ABHD5 Q8WTS1 1/20 0.43
GSK3B P49841 1/20 0.43
BACE1 P56817 1/20 0.43
TYR P14679 1/20 0.42
SRD5A2 P31213 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006787 1.00 XDH (0.51) XDHF3HSD11B1KMT2AAPP
SCHEMBL9006668 0.91 F3 (0.58) F3HSD11B1KMT2ACYP2D6CYP1A2
SCHEMBL9006591 0.91 F3 (0.58) F3HSD11B1KMT2ACYP2D6CYP1A2
SCHEMBL25191767 0.90 XDH (0.65) XDHF3KMT2AAPPALDH1A1
SCHEMBL9006616 0.88 F3 (0.59) F3HSD11B1KMT2ACYP2D6CYP1A2
SCHEMBL9006612 0.88 F3 (0.59) F3HSD11B1KMT2ACYP2D6CYP1A2
SCHEMBL9006530 0.87 KMT2A (0.57) F3HSD11B1KMT2ACYP2D6CYP1A2
SCHEMBL9006742 0.85 F3 (0.62) XDHF3HSD11B1KMT2ACYP2D6
SCHEMBL9006741 0.85 F3 (0.62) XDHF3HSD11B1KMT2ACYP2D6
SCHEMBL9006693 0.85 HSD11B1 (0.66) F3HSD11B1KMT2ACYP2D6CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed