SCHEMBL9010791

SCHEMBL9010791

[N-]=[N+]=C(C(=O)c1cccc2ccccc12)S(=O)(=O)c1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.47
NR4A2 P43354 1/20 0.47
NR4A3 Q92570 1/20 0.47
CDC25B P30305 1/20 0.43
MMP3 P08254 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
PTPN1 P18031 1/20 0.40
PLK1 P53350 1/20 0.40
KMT2A Q03164 5/20 0.38
HPGD P15428 4/20 0.38
MEN1 O00255 4/20 0.38
MAPT P10636 4/20 0.38
ALDH1A1 P00352 3/20 0.38
LMNA P02545 3/20 0.38
POLB P06746 3/20 0.38
NPSR1 Q6W5P4 3/20 0.38
TDP1 Q9NUW8 3/20 0.38
KDM4E B2RXH2 3/20 0.38
GMNN O75496 2/20 0.38
MAPK1 P28482 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9011454 0.89 RAB9A (0.46) NR4A1NR4A2NR4A3CDC25BMMP3
SCHEMBL9010789 0.79 MAOB (0.37) KMT2AHPGDMEN1MAPTALDH1A1
SCHEMBL9010921 0.79 ALDH1A1 (0.39) KMT2AHPGDMEN1MAPTALDH1A1
SCHEMBL546386 0.77 CES2 (0.45) KMT2AMEN1MAPTALDH1A1LMNA
SCHEMBL3975777 0.74 SMN1; SMN2 (0.42) KMT2AMAPTALDH1A1LMNATDP1
SCHEMBL9010800 0.74 CES2 (0.53) PTPN1KMT2AHPGDMEN1MAPT
SCHEMBL28830204 0.72 NR4A1 (0.52) NR4A1NR4A2NR4A3CDC25BMMP3
SCHEMBL29494693 0.72 NR4A1 (0.71) NR4A1NR4A2NR4A3CDC25BMMP3
SCHEMBL7218991 0.72 NR4A1 (0.71) NR4A1NR4A2NR4A3CDC25BMMP3
SCHEMBL6884840 0.72 CA1 (0.43) KMT2AMAPTALDH1A1LMNAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109661855-B Photosensitive resin composition for forming organic electroluminescent element spacer, organic electroluminescent element, image display device, and lighting 三菱化学株式会社 2022-07-08 CN disclosed
EP-0417556-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5340682-A Sensitive, heat resistant, noncorrosive HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-23 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417556-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed