SCHEMBL9010789

SCHEMBL9010789

[N-]=[N+]=C(C(=O)c1ccccc1Br)S(=O)(=O)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.37
HPGD P15428 4/20 0.36
KMT2A Q03164 3/20 0.36
TP53 P04637 3/20 0.36
HSD17B10 Q99714 3/20 0.36
MEN1 O00255 2/20 0.36
MAPT P10636 2/20 0.36
MAPK1 P28482 2/20 0.36
USP2 O75604 1/20 0.36
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA9 Q16790 2/20 0.35
CA12 O43570 1/20 0.35
CA7 P43166 1/20 0.35
CA14 Q9ULX7 1/20 0.35
ALDH1A1 P00352 5/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
S1PR2 O95136 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9010858 0.89 POLB (0.41) MAOBHPGDKMT2ATP53MAPT
SCHEMBL9010921 0.82 ALDH1A1 (0.39) HPGDKMT2ATP53HSD17B10MEN1
SCHEMBL9010791 0.79 NR4A1 (0.47) HPGDKMT2ATP53HSD17B10MEN1
SCHEMBL546386 0.79 CES2 (0.45) KMT2ATP53HSD17B10MEN1MAPT
SCHEMBL9010850 0.79 CA2 (0.49) KMT2AMEN1CA1CA2CA9
SCHEMBL3975777 0.77 SMN1; SMN2 (0.42) KMT2ATP53HSD17B10MAPTMAPK1
SCHEMBL9010819 0.75 BRD4 (0.44) HPGDKMT2ATP53MEN1MAPT
SCHEMBL6884840 0.74 CA1 (0.43) KMT2ATP53HSD17B10MAPTMAPK1
SCHEMBL8637821 0.73 KMT2A (0.53) KMT2AMEN1MAPTCA1CA2
SCHEMBL384366 0.73 CES2 (0.51) KMT2ATP53MEN1MAPTUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0417556-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5340682-A Sensitive, heat resistant, noncorrosive HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-23 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417556-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed