Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 7/20 | 0.45 |
| ▸ | CES1 | P23141 | 6/20 | 0.45 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA4 | P22748 | 2/20 | 0.40 |
| ▸ | CA9 | Q16790 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | PRNP | P04156 | 1/20 | 0.39 |
| ▸ | XBP1 | P17861 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL384366 | 0.89 | CES2 (0.51) | CES2CES1HSD11B1MAPTALDH1A1 | |
| SCHEMBL8637821 | 0.89 | KMT2A (0.53) | CES2CES1HSD11B1MAPTCA1 | |
| SCHEMBL9010850 | 0.89 | CA2 (0.49) | CES2CES1HSD11B1CA1CA2 | |
| SCHEMBL384364 | 0.89 | CES2 (0.51) | CES2CES1HSD11B1MAPTALDH1A1 | |
| SCHEMBL9015170 | 0.85 | ALDH1A1 (0.55) | HSD11B1MAPTCA1CA2ALDH1A1 | |
| SCHEMBL9010875 | 0.85 | MAPT (0.46) | MAPTCA1CA2ALDH1A1KMT2A | |
| SCHEMBL9010827 | 0.85 | ALDH1A1 (0.57) | CES2CES1HSD11B1MAPTCA1 | |
| SCHEMBL6929196 | 0.85 | PGR (0.44) | HSD11B1MAPTALDH1A1KMT2AMEN1 | |
| SCHEMBL9010819 | 0.85 | BRD4 (0.44) | HSD11B1MAPTCA1CA2CA9 | |
| SCHEMBL9010834 | 0.85 | KAT6A (0.49) | HSD11B1MAPTALDH1A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 336 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | claimed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | claimed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| US-20240206322-A1 | OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE | KANEKA CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-20240199854-A1 | COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD OF CURED FILM | FUJIFLIM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | disclosed |
| EP-0444493-B1 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AG (DE) | 1996-11-20 | — | — | EP | disclosed |
| US-5424166-A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-13 | — | — | US | disclosed |
| EP-0628876-A1 | Environmentally stable highly sensitive acid amplifier photoresists | International Business Machines Corporation (US) | 1994-12-14 | — | — | EP | disclosed |
| US-5340682-A | Sensitive, heat resistant, noncorrosive | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-23 | — | — | US | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417556-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |