Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MET | P08581 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TGM2 | P21980 | 1/20 | 0.40 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.40 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.40 |
| ▸ | CNR1 | P21554 | 2/20 | 0.40 |
| ▸ | FGFR4 | P22455 | 3/20 | 0.39 |
| ▸ | THRB | P10828 | 2/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.39 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.39 |
| ▸ | FGFR2 | P21802 | 1/20 | 0.39 |
| ▸ | FGFR3 | P22607 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | CNR2 | P34972 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26041858 | 0.92 | MET (0.39) | METPOLBKMT2ATGM2CALM1 | |
| SCHEMBL25501710 | 0.87 | ENPP2 (0.41) | METTGM2CALM1FGFR4THRB | |
| SCHEMBL26038082 | 0.87 | MET (0.37) | METPOLBKMT2ATGM2CALM1 | |
| SCHEMBL10891722 | 0.84 | MMP1 (0.54) | KMT2A | |
| SCHEMBL21913948 | 0.83 | TSHR (0.46) | METTGM2AKR1B1THRBTSHR | |
| SCHEMBL2428833 | 0.83 | ALDH1A1 (0.53) | POLBTGM2THRBTSHR | |
| SCHEMBL10040693 | 0.82 | THRB (0.45) | METAKR1B1THRBTSHRHIF1A | |
| SCHEMBL25311654 | 0.80 | MET (0.67) | METAKR1B1 | |
| SCHEMBL28061640 | 0.80 | MET (0.51) | METKMT2APTGS2 | |
| SCHEMBL28343448 | 0.80 | KMT2A (0.47) | POLBKMT2ACALM1AKR1B1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0410606-B1 | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO LTD (JP) | 1996-11-13 | — | — | EP | disclosed |
| US-5338640-A | Alkali-developable; resistance to oxygen etching; multilayer photoresists; photolithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-16 | — | — | US | disclosed |
| US-5278273-A | Additional polymer | FUJI PHOTO FILM CO., LTD. (JP) | 1994-01-11 | — | — | US | disclosed |
| US-5276124-A | Ladder polymers, photoresists, lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1994-01-04 | — | — | US | disclosed |
| US-5252686-A | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-12 | — | — | US | disclosed |
| US-5216105-A | SILICONE POLYMERS AND POSITIVE WORKING LIGHT-SENSITIVE COMPOSITIONS COMPRISING THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| EP-0410606-A2 | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-30 | — | — | EP | disclosed |