Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.33 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 4/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.36 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.36 |
| ▸ | APP | P05067 | 1/20 | 0.36 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | MMP2 | P08253 | 1/20 | 0.34 |
| ▸ | MMP9 | P14780 | 1/20 | 0.34 |
| ▸ | MMP8 | P22894 | 1/20 | 0.34 |
| ▸ | MMP14 | P50281 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL9445128 | 0.89 | ALDH1A1 (0.41) | MEN1KMT2AMAPTLMNANPC1 | |
| Hydrochloric Acid SCHEMBL3245514 | 0.86 | CYP2A6 (0.47) | LMNACYP1A1CYP1B1CYP2A6CA1 | |
| SCHEMBL112852 | 0.83 | — | — | |
| Water SCHEMBL809328 | 0.81 | CYP2A6 (0.47) | CYP1A1CYP1B1CYP2A6CA1CA2 | |
| Hydrochloric Acid SCHEMBL8911949 | 0.80 | ALDH1A1 (0.59) | MEN1KMT2AMAPTLMNAPTGS1 | |
| Fluoride Ion SCHEMBL4307159 | 0.79 | CYP2A6 (0.44) | MEN1KMT2ACYP1A1CYP1B1CYP2A6 | |
| Hydrochloric Acid SCHEMBL10895645 | 0.78 | DNM1 (0.41) | MEN1KMT2AMAPTLMNACYP1A1 | |
| Hydrochloric Acid SCHEMBL9319421 | 0.78 | HPGD (0.52) | RAPGEF4MEN1KMT2AMAPTLMNA | |
| Hydrochloric Acid SCHEMBL11570682 | 0.78 | ALDH1A1 (0.56) | MEN1KMT2AMAPTLMNAPTGS1 | |
| Hydrochloric Acid SCHEMBL10936047 | 0.78 | ALDH1A1 (0.56) | MEN1KMT2AMAPTLMNAPTGS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5538825-A | Printing plate preparation process | XEROX CORPORATION (US) | 1996-07-23 | — | — | US | disclosed |
| US-5102756-A | Camera speed printing plate with in situ mask | XEROX CORPORATION (US) | 1992-04-07 | — | — | US | disclosed |
| US-4608331-A | Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer | WITCO CHEMICAL CORPORATION (US) | 1986-08-26 | — | — | US | disclosed |
| EP-0186959-A1 | Photosensitive polyurethanes and plates | WITCO CHEMICAL CORPORATION (US) | 1986-07-09 | — | — | EP | disclosed |
| US-4576899-A | Method for enhancing apparent photospeed of diazonium plates by using thiocyanate to insolubilize diazonium compound after photolysis | IMPERIAL METAL & CHEMICAL COMPANY (US) | 1986-03-18 | — | — | US | disclosed |
| US-4499170-A | Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative | RICHARDSON GRAPHICS COMPANY (US) | 1985-02-12 | — | — | US | disclosed |
| US-4230492-A | P-CHLOROBENZENESULFONIC ACID, DIAZO RESIN | THE RICHARDSON COMPANY (US) | 1980-10-28 | — | — | US | disclosed |