SCHEMBL91175

SCHEMBL91175

C=C(C)C(=O)Oc1ccc2c(c1)CCO2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.46
ATM Q13315 1/20 0.46
CA2 P00918 2/20 0.45
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA9 Q16790 1/20 0.45
ELANE P08246 1/20 0.42
HDAC3 O15379 2/20 0.42
HDAC4 P56524 2/20 0.42
HDAC1 Q13547 2/20 0.42
HDAC7 Q8WUI4 2/20 0.42
HDAC2 Q92769 2/20 0.42
HDAC10 Q969S8 2/20 0.42
HDAC11 Q96DB2 2/20 0.42
HDAC8 Q9BY41 2/20 0.42
HDAC6 Q9UBN7 2/20 0.42
HDAC9 Q9UKV0 2/20 0.42
HDAC5 Q9UQL6 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.41
ALDH1A1 P00352 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL75170 0.92 KMT2A (0.44) KMT2AATMCA2CA12CA1
SCHEMBL9479673 0.86 MAPT (0.52) KMT2ACA2CA12CA1CA9
SCHEMBL74946 0.82 GRM5 (0.49) KMT2AATMELANESMN1; SMN2ALDH1A1
SCHEMBL17082416 0.81 KMT2A (0.45) KMT2AATMCA2ELANESMN1; SMN2
SCHEMBL10448606 0.81 ALDH1A1 (0.45) KMT2AATMCA2ELANESMN1; SMN2
SCHEMBL76679 0.81 KMT2A (0.47) KMT2AATMCA2CA12CA9
SCHEMBL3261357 0.80 CA2 (0.50) CA2CA12CA1CA9HDAC3
SCHEMBL29010952 0.80 CA12 (0.53) KMT2ACA2CA12CA1CA9
SCHEMBL1629444 0.79 CYP3A4 (0.43) KMT2AATMCA2ELANESMN1; SMN2
SCHEMBL10204650 0.79 MTNR1A (0.48) KMT2AATMELANESMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120183903-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120135349-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-31 US disclosed
US-8129100-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20100159404-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US disclosed
US-7741015-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-22 US disclosed
US-20090253084-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-08 US disclosed
US-20080199806-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-08-21 US disclosed