Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL9126802

COc1ccc(C(=O)C(O)c2ccc(OC)cc2)cc1.O=S(=O)(O)C(F)(F)F

nearest known ligand 0.74

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.53
CES1 P23141 3/20 0.53
GABBR2 O75899 1/20 0.48
GABBR1 Q9UBS5 1/20 0.48
ALDH1A1 P00352 5/20 0.43
CYP1A2 P05177 1/20 0.43
TSHR P16473 1/20 0.42
HSD17B10 Q99714 1/20 0.42
CA1 P00915 5/20 0.41
CA2 P00918 5/20 0.41
POLB P06746 1/20 0.41
MAPT P10636 1/20 0.41
MEN1 O00255 1/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
KMT2A Q03164 1/20 0.41
SLC2A1 P11166 1/20 0.41
LMNA P02545 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
HTT P42858 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9128631 0.88 CA1 (0.49) CES2CES1ALDH1A1CYP1A2CA1
SCHEMBL68736 0.86 CES2 (0.55) CES2CES1GABBR2GABBR1ALDH1A1
Methoxymethane SCHEMBL36596 0.85 CES2 (0.53) CES2CES1GABBR2GABBR1ALDH1A1
SCHEMBL7122948 0.81 ALDH1A1 (0.51) ALDH1A1CYP1A2MAPTMEN1NPC1
SCHEMBL6473480 0.80 MAPT (0.49) CES2CES1ALDH1A1CYP1A2CA1
SCHEMBL12168990 0.80 NPSR1 (0.56) CES2CES1ALDH1A1CYP1A2CA1
SCHEMBL4809737 0.79 RAB9A (0.62) CES2CES1ALDH1A1CYP1A2CA1
SCHEMBL1927479 0.79 RAB9A (0.48) CES2CES1GABBR2GABBR1ALDH1A1
SCHEMBL5444947 0.79 HPGD (0.62) CES2CES1ALDH1A1CYP1A2POLB
SCHEMBL2528895 0.79 LMNA (0.67) CES2CES1GABBR2GABBR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5449705-A Silicon-containing polyamic acid derivative and photosensitive resin composition using it CHISSO CORPORATION (JP) 1995-09-12 US disclosed
US-5442024-A Polyamic acid having a crosslinkable silane group or copolymerized with a polysiloxane and a compound generating an acid catalyst to effect imidation upon radiating; films; photoresists; shrinkage inhibition; resolution; adhesion CHISSO CORPORATION (JP) 1995-08-15 US disclosed