SCHEMBL915137

SCHEMBL915137

CCOP(=O)(O)Cc1ccc(C(=O)c2ccc(OCCOC)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 4/20 0.47
LMNA P02545 3/20 0.47
MAPK1 P28482 1/20 0.47
MAPT P10636 5/20 0.45
KMT2A Q03164 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
PPARG P37231 3/20 0.43
PPARD Q03181 1/20 0.43
PPARA Q07869 1/20 0.43
GAA P10253 2/20 0.41
RAB9A P51151 2/20 0.41
ALDH1A1 P00352 2/20 0.41
HTT P42858 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
CYP19A1 P11511 2/20 0.41
PLK1 P53350 1/20 0.40
BCHE P06276 1/20 0.40
ACHE P22303 1/20 0.40
HRH2 P25021 1/20 0.40
HRH1 P35367 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916688 0.92 ACACB (0.41) L3MBTL1LMNAMAPTALDH1A1SMN1; SMN2
SCHEMBL914845 0.90 GAA (0.55) L3MBTL1LMNAMAPK1MAPTKMT2A
SCHEMBL915717 0.88 PTPN1 (0.43) HTTSMN1; SMN2ACACB
SCHEMBL914836 0.88 S1PR1 (0.43) MAPTPPARGPPARDPPARAACACB
SCHEMBL915355 0.88 LTA4H (0.41) MAPTPPARGPPARDPPARAACACB
SCHEMBL4450708 0.86 KMT2A (0.46) L3MBTL1LMNAMAPK1MAPTKMT2A
SCHEMBL915544 0.86 MAPT (0.49) L3MBTL1LMNAMAPK1MAPTPPARG
SCHEMBL915294 0.84 SMN1; SMN2 (0.37) LMNAMAPTNPSR1GAASMN1; SMN2
SCHEMBL915837 0.83 KDM4E (0.44) LMNAKMT2AGAARAB9AALDH1A1
SCHEMBL915546 0.83 GAA (0.44) L3MBTL1LMNAKMT2ANPSR1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed