Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 6/20 | 0.60 |
| ▸ | CA4 | P22748 | 6/20 | 0.60 |
| ▸ | CA9 | Q16790 | 6/20 | 0.60 |
| ▸ | CA1 | P00915 | 2/20 | 0.57 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.52 |
| ▸ | MAOB | P27338 | 9/20 | 0.51 |
| ▸ | MAOA | P21397 | 7/20 | 0.51 |
| ▸ | ACHE | P22303 | 1/20 | 0.51 |
| ▸ | CA2 | P00918 | 1/20 | 0.47 |
| ▸ | CA7 | P43166 | 1/20 | 0.47 |
| ▸ | AGXT | P21549 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29646218 | 1.00 | CA12 (0.60) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL9061932 | 0.96 | CA12 (0.64) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL9043883 | 0.92 | CA12 (0.57) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL9293936 | 0.90 | CA12 (0.55) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL20530596 | 0.89 | MAOB (0.51) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL20530609 | 0.89 | CA12 (0.51) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL20530606 | 0.84 | CA12 (0.54) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL20530611 | 0.84 | MAOB (0.54) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL13301426 | 0.84 | CA12 (0.54) | CA12CA4CA9CA1GSTP1 | |
| SCHEMBL14106712 | 0.84 | CA12 (0.54) | CA12CA4CA9CA1GSTP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675357-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-12379663-B2 | Material for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-05 | — | — | US | disclosed |
| US-12379662-B2 | Material for forming organic film, patterning process, compound, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-05 | — | — | US | disclosed |
| EP-4020083-B1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHINETSU CHEMICAL CO (JP) | 2024-10-16 | — | — | EP | disclosed |
| US-20240337944-A1 | Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film | SHIN- ETSU CHEMICAL CO., LTD. (JP) | 2024-10-10 | — | — | US | disclosed |
| EP-4425261-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERN FORMING METHOD, AND METHOD OF FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-04 | — | — | EP | disclosed |
| WO-2024142925-A1 | SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD, COMPOSITION, AND POLYMER | JSR株式会社 | 2024-07-04 | — | — | WO | disclosed |
| EP-3869268-B1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHINETSU CHEMICAL CO (JP) | 2024-01-17 | — | — | EP | disclosed |
| EP-3869268-B1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHINETSU CHEMICAL CO (JP) | 2024-01-17 | — | — | EP | disclosed |
| US-10429739-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10429739-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| EP-0333445-B1 | Aromatic allene compounds and preparation thereof | NIPPON PAINT CO LTD (JP) | 1995-01-18 | — | — | EP | disclosed |
| US-5340931-A | Chemical intermediates for allyl or vinyl ether polymers | NIPPON PAINT CO., LTD. (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0333445-A2 | Aromatic allene compounds and preparation thereof | NIPPON PAINT CO., LTD. (JP) | 1989-09-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | CA12 200/4885CA4 311/4885CA9 447/4885 |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | CHRM1, MLX, OR10J3 | CA12 2457/4885CA4 2878/4885CA9 2264/4885 |
| US-12379662-B2 | Material for forming organic film, patterning process, compound, and polymer | RER1, SMC4, RAD51 | CA12 2285/4885CA4 1578/4885CA9 2866/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.