SCHEMBL916688

SCHEMBL916688

CCOP(=O)(O)Cc1ccc(OCCOC)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACACB O00763 1/20 0.41
KDM4E B2RXH2 2/20 0.41
RECQL P46063 1/20 0.41
MAPT P10636 1/20 0.40
S1PR1 P21453 4/20 0.39
S1PR3 Q99500 4/20 0.39
S1PR2 O95136 2/20 0.39
LPAR2 Q9HBW0 2/20 0.39
PKM P14618 1/20 0.39
S1PR4 O95977 2/20 0.39
S1PR5 Q9H228 2/20 0.39
LMNA P02545 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
ALDH1A1 P00352 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
CYP2C19 P33261 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
PDE4A P27815 1/20 0.38
HIF1A Q16665 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914836 0.96 S1PR1 (0.43) ACACBKDM4ERECQLMAPTS1PR1
SCHEMBL915717 0.96 PTPN1 (0.43) ACACBKDM4ERECQLS1PR1S1PR3
SCHEMBL915355 0.96 LTA4H (0.41) ACACBKDM4ERECQLMAPTS1PR1
SCHEMBL915137 0.92 L3MBTL1 (0.47) ACACBMAPTLMNAL3MBTL1ALDH1A1
SCHEMBL915294 0.92 SMN1; SMN2 (0.37) ACACBKDM4ERECQLMAPTS1PR1
SCHEMBL915546 0.91 GAA (0.44) ACACBPKMLMNAL3MBTL1ALDH1A1
SCHEMBL915837 0.91 KDM4E (0.44) KDM4ES1PR1S1PR3S1PR4S1PR5
SCHEMBL914815 0.88 NR1I2 (0.46) RECQLS1PR1S1PR3S1PR2LPAR2
SCHEMBL915260 0.86 KDM4E (0.42) ACACBKDM4ERECQLMAPTPKM
SCHEMBL915282 0.85 S1PR1 (0.46) RECQLS1PR1S1PR3S1PR2LPAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed