SCHEMBL915868

SCHEMBL915868

CCOP(=O)(O)Cc1ccc(Sc2ccc(O)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 1/20 0.44
POLB P06746 1/20 0.38
PPARD Q03181 1/20 0.37
PTPN1 P18031 1/20 0.36
KCNH2 Q12809 1/20 0.36
HDAC1 Q13547 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
LMNA P02545 1/20 0.35
MAPT P10636 1/20 0.35
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
ESR1 P03372 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
ESR2 Q92731 1/20 0.34
CA14 Q9ULX7 1/20 0.34
ENPP2 Q13822 1/20 0.34
CETP P11597 3/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915441 0.90 PPARD (0.44) POLBPPARDPTPN1HDAC1MEN1
SCHEMBL915687 0.88 NR1H2 (0.44) NR1H2POLBPPARDPTPN1KCNH2
Butane SCHEMBL27659367 0.87 POLB (0.41) POLBPPARDPTPN1HDAC1MEN1
SCHEMBL915285 0.85 PTPN1 (0.50) POLBPPARDPTPN1HDAC1MEN1
SCHEMBL915108 0.85 HDAC1 (0.42) POLBPPARDPTPN1HDAC1CA12
SCHEMBL915296 0.84 ENPP2 (0.51) CA1CA2ENPP2
SCHEMBL915291 0.84 ALDH1A1 (0.45) KCNH2HDAC1KMT2ALMNACETP
SCHEMBL17488978 0.83 PPARD (0.50) POLBPPARDKCNH2HDAC1ENPP2
SCHEMBL914831 0.83 LTA4H (0.51) NR1H2POLBPPARDPTPN1MEN1
SCHEMBL4439215 0.82 SMN1; SMN2 (0.39) PPARDPTPN1HDAC1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed