SCHEMBL915546

SCHEMBL915546

CCOP(=O)(O)Cc1ccc(S(=O)(=O)c2ccc(OCCOC)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.44
NPSR1 Q6W5P4 1/20 0.44
ALDH1A1 P00352 3/20 0.39
LIMK2 P53671 1/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
LMNA P02545 3/20 0.39
TSHR P16473 2/20 0.39
HTT P42858 1/20 0.39
PKM P14618 4/20 0.39
CA12 O43570 3/20 0.38
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
CA7 P43166 3/20 0.38
CA9 Q16790 3/20 0.38
KMT2A Q03164 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
NAMPT P43490 1/20 0.37
MMP2 P08253 3/20 0.37
MMP9 P14780 2/20 0.37
MMP12 P39900 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916688 0.91 ACACB (0.41) ALDH1A1SMN1; SMN2LMNAPKML3MBTL1
SCHEMBL915529 0.90 GAA (0.44) GAANPSR1ALDH1A1SMN1; SMN2LMNA
SCHEMBL4440816 0.87 GAA (0.46) GAANPSR1ALDH1A1SMN1; SMN2LMNA
SCHEMBL914836 0.87 S1PR1 (0.43) ACACB
SCHEMBL915717 0.87 PTPN1 (0.43) SMN1; SMN2HTTACACB
SCHEMBL915355 0.87 LTA4H (0.41) ACACB
SCHEMBL915316 0.87 MMP2 (0.45) GAANPSR1ALDH1A1LIMK2SMN1; SMN2
SCHEMBL915294 0.83 SMN1; SMN2 (0.37) GAANPSR1SMN1; SMN2LMNAMMP2
SCHEMBL915137 0.83 L3MBTL1 (0.47) GAANPSR1ALDH1A1SMN1; SMN2LMNA
SCHEMBL915837 0.82 KDM4E (0.44) GAAALDH1A1SMN1; SMN2LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed