SCHEMBL915629

SCHEMBL915629

CCOP(=O)(Cc1ccc(Cc2ccc(O)cc2)cc1)OCC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.48
ESR2 Q92731 2/20 0.48
PTPN1 P18031 1/20 0.46
EGFR P00533 2/20 0.44
POLB P06746 1/20 0.41
TLR8 Q9NR97 1/20 0.40
TLR7 Q9NYK1 1/20 0.40
NPY5R Q15761 1/20 0.40
TSHR P16473 1/20 0.38
HDAC1 Q13547 1/20 0.37
PPARD Q03181 1/20 0.37
MAPT P10636 1/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
PTK2 Q05397 1/20 0.36
CCNT1 O60563 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL283016 0.95 EGFR (0.47) ESR1ESR2PTPN1EGFRPOLB
SCHEMBL914644 0.93 EGFR (0.46) ESR1ESR2PTPN1EGFRPOLB
SCHEMBL915420 0.90 EGFR (0.44) ESR1ESR2EGFRPOLBNPY5R
SCHEMBL915403 0.87 LTA4H (0.51) ESR1ESR2PTPN1EGFRPOLB
SCHEMBL915285 0.86 PTPN1 (0.50) ESR1ESR2PTPN1EGFRPOLB
SCHEMBL915687 0.85 NR1H2 (0.44) ESR1ESR2PTPN1EGFRPOLB
SCHEMBL914846 0.85 MAPT (0.47) ESR1ESR2EGFRPOLBNPY5R
SCHEMBL3375825 0.85 TSHR (0.50) EGFRPOLBTLR8TLR7NPY5R
SCHEMBL916528 0.84 GAA (0.46) ESR1EGFRPOLBNPY5RHDAC1
SCHEMBL2239195 0.84 ESR1 (0.43) ESR1EGFRTLR8TLR7TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed