SCHEMBL915420

SCHEMBL915420

CCOP(=O)(Cc1ccc(-c2ccc(O)cc2)cc1)OCC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 2/20 0.44
HDAC1 Q13547 2/20 0.42
POLB P06746 1/20 0.41
NPY5R Q15761 1/20 0.40
CCNT1 O60563 2/20 0.39
CDK9 P50750 2/20 0.39
ESR2 Q92731 3/20 0.38
ESR1 P03372 2/20 0.38
TSHR P16473 1/20 0.38
PPARD Q03181 1/20 0.37
MAPT P10636 1/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
LTB4R2 Q9NPC1 1/20 0.37
HDAC2 Q92769 1/20 0.37
HDAC8 Q9BY41 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL283016 0.95 EGFR (0.47) EGFRHDAC1POLBNPY5RCCNT1
SCHEMBL914644 0.93 EGFR (0.46) EGFRHDAC1POLBNPY5RCCNT1
SCHEMBL2493713 0.91 TSHR (0.44) EGFRHDAC1POLBNPY5RCCNT1
SCHEMBL915629 0.90 ESR1 (0.48) EGFRHDAC1POLBNPY5RCCNT1
SCHEMBL915403 0.87 LTA4H (0.51) EGFRPOLBESR2ESR1
SCHEMBL915108 0.86 HDAC1 (0.42) HDAC1POLBESR2ESR1PPARD
SCHEMBL914846 0.85 MAPT (0.47) EGFRHDAC1POLBNPY5RESR2
SCHEMBL915687 0.85 NR1H2 (0.44) EGFRHDAC1POLBNPY5RCCNT1
SCHEMBL3375825 0.85 TSHR (0.50) EGFRHDAC1POLBNPY5RCCNT1
SCHEMBL17485921 0.84 HDAC1 (0.40) EGFRHDAC1POLBNPY5RCCNT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed