SCHEMBL915687

SCHEMBL915687

CCOP(=O)(Cc1ccc(Sc2ccc(O)cc2)cc1)OCC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NR1H2 P55055 1/20 0.44
▸ EGFR P00533 2/20 0.41
▸ POLB P06746 1/20 0.38
▸ NPY5R Q15761 1/20 0.38
▸ KCNH2 Q12809 1/20 0.36
▸ HDAC1 Q13547 1/20 0.35
▸ MAPT P10636 2/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ LMNA P02545 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ CCNT1 O60563 2/20 0.34
▸ CDK9 P50750 2/20 0.34
▸ TSHR P16473 1/20 0.34
▸ PPARD Q03181 1/20 0.34
▸ CA12 O43570 1/20 0.34
▸ CA1 P00915 1/20 0.34
▸ CA2 P00918 1/20 0.34
▸ ESR1 P03372 1/20 0.34
▸ CA7 P43166 1/20 0.34
▸ CA9 Q16790 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL283016 0.90 EGFR (0.47) EGFRPOLBNPY5RHDAC1MAPT
SCHEMBL914644 0.89 EGFR (0.46) EGFRPOLBNPY5RHDAC1MAPT
SCHEMBL915868 0.88 NR1H2 (0.44) NR1H2EGFRPOLBKCNH2HDAC1
SCHEMBL915629 0.85 ESR1 (0.48) EGFRPOLBNPY5RHDAC1MAPT
SCHEMBL915420 0.85 EGFR (0.44) EGFRPOLBNPY5RHDAC1MAPT
SCHEMBL915403 0.83 LTA4H (0.51) NR1H2EGFRPOLBMEN1KMT2A
SCHEMBL914846 0.81 MAPT (0.47) EGFRPOLBNPY5RHDAC1MAPT
SCHEMBL3375825 0.81 TSHR (0.50) EGFRPOLBNPY5RKCNH2HDAC1
SCHEMBL1486884 0.80 NPY5R (0.40) NPY5RKCNH2CCNT1CDK9TSHR
SCHEMBL916528 0.80 GAA (0.46) EGFRPOLBNPY5RHDAC1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 — — US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 — — US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 — — EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 — — US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 — — US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 — — CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 — — EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 — — EP disclosed
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