SCHEMBL914846

SCHEMBL914846

CCOP(=O)(Cc1ccc(C(=O)c2ccc(O)cc2)cc1)OCC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.47
ESR1 P03372 3/20 0.47
HTT P42858 3/20 0.47
ESR2 Q92731 2/20 0.47
LMNA P02545 2/20 0.47
PKM P14618 1/20 0.47
HPGD P15428 1/20 0.47
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA7 P43166 1/20 0.45
CA9 Q16790 1/20 0.45
CA14 Q9ULX7 1/20 0.45
HDAC1 Q13547 1/20 0.42
SRD5A2 P31213 1/20 0.42
EGFR P00533 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
MAPK1 P28482 1/20 0.41
ELANE P08246 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL283016 0.90 EGFR (0.47) MAPTESR1HTTESR2LMNA
SCHEMBL914644 0.89 EGFR (0.46) MAPTESR1HTTESR2CA12
SCHEMBL9440266 0.88 ALDH1A1 (0.49) MAPTHTTLMNAHPGDHDAC1
SCHEMBL914720 0.88 ESR1 (0.47) MAPTESR1HTTESR2LMNA
SCHEMBL915629 0.85 ESR1 (0.48) MAPTESR1HTTESR2CA12
SCHEMBL915420 0.85 EGFR (0.44) MAPTESR1HTTESR2CA12
SCHEMBL14809467 0.85 ACHE (0.49) MAPTHTTLMNAHPGDCA1
SCHEMBL915403 0.83 LTA4H (0.51) ESR1ESR2EGFRMEN1KMT2A
SCHEMBL1987238 0.82 KMT2A (0.50) MAPTHTTLMNAHPGDHDAC1
SCHEMBL8671670 0.82 HDAC1 (0.45) MAPTHTTHDAC1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed