SCHEMBL915768

SCHEMBL915768

CCC(C)OP(=O)(O)Cc1ccc(C(=O)O)cc1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.46
MAPT P10636 2/20 0.43
RXRA P19793 3/20 0.40
RXRB P28702 3/20 0.40
KMT2A Q03164 3/20 0.39
RARB P10826 6/20 0.39
MAPK1 P28482 1/20 0.38
HTT P42858 1/20 0.38
NPC1 O15118 1/20 0.37
POLB P06746 1/20 0.37
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
MEN1 O00255 1/20 0.37
RARA P10276 1/20 0.37
MTOR P42345 1/20 0.37
KDM4E B2RXH2 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL917305 0.96 RARB (0.46) ALDH1A1MAPTRXRARXRBKMT2A
SCHEMBL1987239 0.88 KMT2A (0.43) ALDH1A1MAPTKMT2AMAPK1HTT
SCHEMBL915305 0.86 LOXL2 (0.46) ALDH1A1MAPTKMT2AMAPK1NPC1
SCHEMBL914197 0.85 MEN1 (0.35) ALDH1A1MAPTKMT2AMAPK1SMN1; SMN2
SCHEMBL914847 0.85 ESR1 (0.41) ALDH1A1MAPTKMT2AMAPK1HTT
SCHEMBL1407856 0.84 TRPA1 (0.42) KMT2APOLBMEN1
SCHEMBL915155 0.83 FOLH1 (0.47) RAB9ASMN1; SMN2
SCHEMBL915165 0.83 ESR1 (0.38) MAPTKMT2AMEN1KDM4E
SCHEMBL915243 0.83 PGK1 (0.37) KMT2ANPC1RAB9ASMN1; SMN2MEN1
SCHEMBL915113 0.82 LOXL2 (0.43) MAPTKMT2ANPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed