SCHEMBL915305

SCHEMBL915305

CCC(C)OP(=O)(O)Cc1ccc(C(=O)OC)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 1/20 0.46
MAPT P10636 3/20 0.44
CYP4A11 Q02928 2/20 0.43
CYP4F2 P78329 1/20 0.42
STAT3 P40763 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.41
NPC1 O15118 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
RAB9A P51151 1/20 0.41
CA1 P00915 3/20 0.40
CA2 P00918 3/20 0.40
TDP1 Q9NUW8 2/20 0.40
CA12 O43570 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
ALDH1A1 P00352 3/20 0.39
HPGD P15428 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915113 0.96 LOXL2 (0.43) LOXL2MAPTCYP4A11CYP4F2STAT3
SCHEMBL915656 0.86 HSD17B10 (0.46) LOXL2MAPTCYP4A11CYP4F2L3MBTL1
SCHEMBL915768 0.86 ALDH1A1 (0.46) MAPTNPC1SMN1; SMN2MEN1KMT2A
SCHEMBL1987239 0.86 KMT2A (0.43) MAPTL3MBTL1SMN1; SMN2MEN1KMT2A
SCHEMBL915374 0.84 LOXL2 (0.51) LOXL2MAPTCYP4A11CYP4F2SMN1; SMN2
SCHEMBL917305 0.82 RARB (0.46) MAPTNPC1SMN1; SMN2MEN1KMT2A
SCHEMBL914847 0.82 ESR1 (0.41) MAPTSMN1; SMN2MEN1KMT2ARAB9A
SCHEMBL914038 0.81 ANPEP (0.44) NPC1SMN1; SMN2RAB9AALDH1A1CYP1A2
SCHEMBL915165 0.81 ESR1 (0.38) MAPTMEN1KMT2ATDP1CYP1A2
SCHEMBL915436 0.81 LOXL2 (0.53) LOXL2MAPTCYP4A11CYP4F2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed
US-4233440-A OPTICAL BRIGHTENERS BAYER AKTIENGESELLSCHAFT (DE) 1980-11-11 US disclosed