Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.53 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 1/20 | 0.41 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.41 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.41 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.41 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.41 |
| ▸ | IDO1 | P14902 | 3/20 | 0.37 |
| ▸ | TDO2 | P48775 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.34 |
| ▸ | G6PD | P11413 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1535668 | 1.00 | TSHR (0.53) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Iodide SCHEMBL6930682 | 0.97 | TSHR (0.50) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Bromide SCHEMBL3139794 | 0.97 | TSHR (0.50) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Bromide SCHEMBL3129122 | 0.97 | TSHR (0.50) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Perchlorate SCHEMBL3132374 | 0.91 | TSHR (0.43) | TSHRCYP1A2LMNACYP2A6CES2 | |
| SCHEMBL3141304 | 0.91 | CYP1A2 (0.48) | TSHRCYP1A2LMNACYP2A6CES2 | |
| Perchlorate SCHEMBL3136664 | 0.91 | TSHR (0.43) | TSHRCYP1A2LMNACYP2A6CES2 | |
| SCHEMBL31501941 | 0.91 | TSHR (0.43) | TSHRCYP1A2LMNACYP2A6CES2 | |
| SCHEMBL30118167 | 0.91 | TSHR (0.43) | TSHRCYP1A2LMNACYP2A6CES2 | |
| SCHEMBL3143548 | 0.91 | CYP1A2 (0.48) | TSHRCYP1A2LMNACYP2A6CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 200 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-112930266-B | Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method | 富士胶片株式会社 | 2023-02-28 | — | — | CN | disclosed |
| CN-111217946-B | Composition comprising a compound containing a vinyl group | 东京应化工业株式会社 | 2022-12-06 | — | — | CN | disclosed |
| EP-2110261-B1 | Aluminum alloy plate for lithographic printing plate, ligthographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support | FUJIFILM CORP (JP) | 2018-03-28 | — | — | EP | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| EP-1552923-B1 | Lithographic printing plate precursor and lithographic printing method using the same | FUJIFILM CORP (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| EP-2618215-B1 | Method for producing a lithographic printing plate | FUJIFILM CORP (JP) | 2017-07-05 | — | — | EP | disclosed |
| US-9032876-B2 | Lithographic printing plate precursor, lithographic printing plate platemaking method, and polymerizable monomer | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-9034560-B2 | Negative resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20070039500-A1 | Manufacturing method of lithographic printing plate and manufacturing apparatus of lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-22 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-20050016402-A1 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. | 2005-01-27 | — | — | US | disclosed |
| EP-1484177-A2 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-08 | — | — | EP | disclosed |
| US-6605409-B2 | Includes a compound that generates a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having an acid decomposable group which increases solubility in an alkali developer; improved resolving power | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-12 | — | — | US | disclosed |
| US-20020006578-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-01-17 | — | — | US | disclosed |
| EP-1158363-A1 | Positive resist composition and onium salts of saccharin derivatives | FUJI PHOTO FILM CO., LTD. (JP) | 2001-11-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | TSHR 2626/4885CYP1A2 633/4885LMNA 4638/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.