SCHEMBL92273

SCHEMBL92273

C=C(C)C(=O)OCCC(=O)OCOC1Cc2ccccc2C1

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
MTNR1A P48039 4/20 0.35
MTNR1B P49286 4/20 0.35
TDP1 Q9NUW8 2/20 0.35
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
THRB P10828 1/20 0.35
TSHR P16473 3/20 0.34
MAPT P10636 1/20 0.34
MAPK1 P28482 1/20 0.34
ALDH1A1 P00352 1/20 0.33
IDO1 P14902 2/20 0.32
NR1D1 P20393 1/20 0.32
FFAR1 O14842 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL73893 0.89 ALDH1A1 (0.38) CA1CA2MTNR1AMTNR1BTDP1
SCHEMBL92269 0.87 ALDH1A1 (0.35) CA1CA2MTNR1AMTNR1BTDP1
SCHEMBL92272 0.81 MTNR1A (0.43) MTNR1AMTNR1BALDH1A1
SCHEMBL9891413 0.73 FABP7 (0.45) MTNR1AMTNR1BALDH1A1IDO1FFAR1
SCHEMBL27651820 0.72 ALDH1A1 (0.53) TDP1POLBAPEX1HTTTSHR
SCHEMBL16858730 0.71 THRB (0.40) CA1CA2MTNR1AMTNR1BTDP1
SCHEMBL16660502 0.71 ELANE (0.47) MTNR1AMTNR1BTDP1POLBAPEX1
SCHEMBL8006417 0.71 ELANE (0.49) TDP1POLBAPEX1HTTTHRB
SCHEMBL2466488 0.70 THRB (0.59) CA1CA2TDP1POLBAPEX1
SCHEMBL92238 0.69 IDO1 (0.36) MTNR1AMTNR1BIDO1FFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8129086-B2 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-8129086-B2 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20090297979-A1 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed
US-20090297979-A1 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090297979-A1 Polymerizable compound, polymer, positive resist composition, and patterning process using the same PRRC2A, PUF60, POLR2B CA1 286/4885CA2 623/4885MTNR1A 4126/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.