SCHEMBL92296

SCHEMBL92296

CCC(C)(C)C(=O)OCOC1Cc2ccccc2C1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 7/20 0.39
FFAR1 O14842 1/20 0.36
IDO1 P14902 2/20 0.35
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
MTNR1A P48039 1/20 0.34
MTNR1B P49286 1/20 0.34
BCHE P06276 2/20 0.34
MLNR O43193 1/20 0.34
CHRM2 P08172 1/20 0.34
CHRM1 P11229 1/20 0.34
CHRM3 P20309 1/20 0.34
HTR2A P28223 1/20 0.34
HTR2C P28335 1/20 0.34
HRH1 P35367 1/20 0.34
OPRM1 P35372 1/20 0.34
DRD3 P35462 1/20 0.34
OPRK1 P41145 1/20 0.34
HTR2B P41595 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16746603 0.82 RIPK1 (0.42) RIPK1FFAR1IDO1KDM4EALDH1A1
SCHEMBL12892520 0.76 IDO1 (0.40) RIPK1IDO1KDM4EALDH1A1MTNR1A
SCHEMBL92314 0.76 IDO1 (0.45) RIPK1FFAR1IDO1KDM4EALDH1A1
SCHEMBL47524 0.75 HMGCR (0.40) RIPK1FKBP1A
SCHEMBL14825862 0.75 RIPK1 (0.41) RIPK1KDM4EALDH1A1NPSR1MTNR1A
SCHEMBL47512 0.74 HMGCR (0.40) RIPK1KDM4EFKBP1A
SCHEMBL47408 0.74 HMGCR (0.40) RIPK1KDM4EFKBP1A
SCHEMBL14825894 0.74 RIPK1 (0.40) RIPK1KDM4EALDH1A1NPSR1MTNR1A
SCHEMBL73893 0.74 ALDH1A1 (0.38) FFAR1IDO1ALDH1A1MTNR1AMTNR1B
SCHEMBL18132620 0.73 HTR2A (0.43) RIPK1MTNR1AMTNR1BHTR2AHTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-8129086-B2 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20090297979-A1 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090297979-A1 Polymerizable compound, polymer, positive resist composition, and patterning process using the same PRRC2A, PUF60, POLR2B RIPK1 2296/4885FFAR1 1633/4885IDO1 4883/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.