Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | CA5A | P35218 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 4/20 | 0.43 |
| ▸ | POLB | P06746 | 2/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 4/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | TTR | P02766 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | ACHE | P22303 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | CA9 | Q16790 | 2/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29359986 | 1.00 | CA2 (0.46) | CA2CA5AMAPTPOLBPKM | |
| SCHEMBL28798212 | 0.98 | CA2 (0.44) | CA2CA5AMAPTPOLBPKM | |
| SCHEMBL4180035 | 0.87 | CA2 (0.44) | CA2CA5AMAPTPOLBPKM | |
| SCHEMBL21633986 | 0.86 | ELANE (0.46) | CA2CA5AMAPTLMNASMN1; SMN2 | |
| SCHEMBL27873119 | 0.85 | CA2 (0.43) | CA2CA5AMAPTPOLBPKM | |
| SCHEMBL28338942 | 0.83 | ACHE (0.46) | MAPTPOLBPKMSMN1; SMN2ALDH1A1 | |
| SCHEMBL11342772 | 0.81 | CA2 (0.48) | CA2CA5AMAPTPOLBPKM | |
| SCHEMBL67481 | 0.81 | THRB (0.40) | GAA | |
| SCHEMBL15498950 | 0.80 | ESR1 (0.32) | CA2CA5AGAAELANE | |
| SCHEMBL30218032 | 0.79 | ALDH1A1 (0.40) | POLBSMN1; SMN2ALDH1A1KDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109152711-A | Method for producing perfume capsules with improved surfactant stability | 西姆莱斯股份公司 | 2019-01-04 | — | — | CN | claimed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11208509-B2 | Polymer compound for conductive polymer and method for producing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-28 | — | — | US | disclosed |
| US-20200291145-A1 | POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-17 | — | — | US | disclosed |
| US-20200259094-A1 | CONDUCTIVE POLYMER COMPOSITE AND CONDUCTIVE POLYMER COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20200247926-A1 | POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-06 | — | — | US | disclosed |
| CN-104546513-B | The polymer encapsulating active substance of terpolymer coating | 国际香料和香精公司 | 2019-11-15 | — | — | CN | disclosed |
| CN-109922781-A | 1- [(the 4R) -4- methylcyclohexene -1- base] purposes of ethyl ketone as aromachemicals | 巴斯夫欧洲公司 | 2019-06-21 | — | — | CN | disclosed |
| CN-109906114-A | Spherical particle | 巴斯夫欧洲公司 | 2019-06-18 | — | — | CN | disclosed |
| CN-103282475-A | Fragrance compositions comprising special mixtures of diastereomers of 2-sobutyl-4-methyl-tetrahydro-2h-pyran-4-ol | BASF SE | 2013-09-04 | — | — | CN | disclosed |
| US-8389201-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-05 | — | — | US | disclosed |
| US-8361692-B2 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20110003251-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2270596-A2 | Positive resist compostion and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-01-05 | — | — | EP | disclosed |
| US-20100304301-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| EP-2256552-A1 | Negative resist composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-12-01 | — | — | EP | disclosed |
| EP-0505972-B1 | Process for producing styrenic copolymer | IDEMITSU KOSAN CO (JP) | 1997-06-11 | — | — | EP | disclosed |
| CN-1151744-A | Phosphonic acid compounds, their prodn. and use | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1997-06-11 | — | — | CN | disclosed |
| EP-0505972-A2 | Process for producing styrenic copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200247926-A1 | POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND | HCN4, HCN2, HCN3 | CA2 314/4885CA5A 2234/4885MAPT 1482/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.