Toluene

Toluene

SCHEMBL9487580

C1CC[SiH2]OC1.Cc1ccccc1

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.44
TSHR P16473 1/20 0.44
ALOX12 P18054 1/20 0.44
ACHE P22303 1/20 0.44
ORAI1 Q96D31 1/20 0.32
ORAI2 Q96SN7 1/20 0.32
ORAI3 Q9BRQ5 1/20 0.32
TRPV6 Q9H1D0 1/20 0.32
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL14358032 0.83 ALDH1A1 (0.39) ORAI1ORAI2ORAI3TRPV6
Biphenyl SCHEMBL121313 0.83 ALDH1A1 (0.39) ORAI1ORAI2ORAI3TRPV6
Biphenyl SCHEMBL8599004 0.82 ALDH1A1 (0.38) ORAI1ORAI2ORAI3TRPV6
SCHEMBL6849596 0.82
SCHEMBL6924022 0.82
SCHEMBL9490191 0.81 ALDH1A1 (0.30)
Aniline SCHEMBL295550 0.80 TSHR (0.44) TSHRALOX12
Phenol SCHEMBL9243036 0.80 CA12 (0.44)
Phenol SCHEMBL2420081 0.80 CA12 (0.44)
Phenol SCHEMBL6858847 0.80 CA12 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115636994-B Low-density polyethylene resin composition for film 中国石油天然气股份有限公司 2024-03-01 CN disclosed
CN-115636994-A Low-density polyethylene resin composition for film 中国石油天然气股份有限公司 2023-01-24 CN disclosed
CN-108794869-B Polyolefin composition for rotational molding storage tank and preparation method thereof 中国石油化工股份有限公司 2021-04-13 CN disclosed
CN-102736400-B Dustproof pellicle film, manufacturing method thereof, and dustproof pellicle component with pellicle film attached SHINETSU CHEMICAL CO 2014-02-05 CN disclosed
CN-102227683-B Method for performing photolithography using bottom antireflective coatings with graded optical properties ADVANCED MICRO DEVICES INC 2013-07-31 CN disclosed
CN-102736400-A Dustproof pellicle film, manufacturing method thereof, and dustproof pellicle component with pellicle film attached SHINETSU CHEMICAL CO 2012-10-17 CN disclosed
CN-102227683-A Method for performing photolithography using bottom antireflective coatings with graded optical properties ADVANCED MICRO DEVICES INC 2011-10-26 CN disclosed
EP-0349754-B1 FIBRE-TREATMENT COMPOSITION TORAY SILICONE COMPANY, LIMITED (JP) 1993-02-24 EP disclosed
US-4973620-A POLYSILOXANE WITH PENDANT AMINO GROUPS TORAY SILICONE COMPANY, LTD. (JP) 1990-11-27 US disclosed
EP-0349754-A2 Fibre-treatment composition TORAY SILICONE COMPANY, LIMITED (JP) 1990-01-10 EP disclosed