Aminomethylenebisphosphonic Acid

Aminomethylenebisphosphonic Acid

SCHEMBL9497932

NC(P(=O)(O)O)P(=O)(O)O.O=P(O)(O)C(N(CCN(C(P(=O)(O)O)P(=O)(O)O)C(P(=O)(O)O)P(=O)(O)O)C(P(=O)(O)O)P(=O)(O)O)P(=O)(O)O.O=P(O)(O)CP(=O)(O)O.O=P(O)(O)CP(=O)(O)O

nearest known ligand 0.50

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Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.42
MMP2 P08253 1/20 0.42
THRB P10828 1/20 0.42
MAPK1 P28482 1/20 0.42
HSD17B10 Q99714 1/20 0.42
FDPS P14324 2/20 0.38
ANPEP P15144 5/20 0.33
ERAP2 Q6P179 1/20 0.33
OTC P00480 1/20 0.33
GLUL P15104 1/20 0.32
LAP3 P28838 3/20 0.32
ERAP1 Q9NZ08 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Aminomethylenebisphosphonic Acid SCHEMBL7769358 0.82 KDM4E (0.62) KDM4EMMP2THRBMAPK1HSD17B10
SCHEMBL38156 0.82 FDPS (0.50) KDM4EMMP2THRBMAPK1HSD17B10
Medronic Acid SCHEMBL14958162 0.81 FDPS (0.54) KDM4EMMP2THRBMAPK1HSD17B10
Ammonia Solution, Strong SCHEMBL3279112 0.79 FDPS (0.48) KDM4EMMP2THRBMAPK1HSD17B10
Water SCHEMBL7073557 0.79 FDPS (0.48) KDM4EMMP2THRBMAPK1HSD17B10
Medronic Acid SCHEMBL11402591 0.79 FDPS (0.47) KDM4EMMP2THRBMAPK1HSD17B10
Ethylenediamine SCHEMBL5193597 0.78 FDPS (0.43) FDPSANPEPERAP2OTCLAP3
Ethylenediamine SCHEMBL14694305 0.78 FDPS (0.43) FDPSANPEPERAP2OTCLAP3
Aminomethylenebisphosphonic Acid SCHEMBL10355230 0.75 KDM4E (0.53) KDM4EMMP2THRBMAPK1HSD17B10
SCHEMBL12231067 0.75 FDPS (0.44) KDM4EMMP2THRBMAPK1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0273404-B1 PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL AND METHOD OF DEVELOPING THE SAME FUJI PHOTO FILM CO., LTD. (JP) 1993-03-17 EP disclosed
US-5037728-A Photographic material package unit FUJI PHOTO FILM CO., LTD. (JP) 1991-08-06 US disclosed
US-4968595-A CCONTROLLED SO THAT DEVELOPMENT STARTS AT CORNERS OR EDGES OF GRAINS FUJI PHOTO FILM CO., LTD. (JP) 1990-11-06 US disclosed
US-4952490-A LOW FOG; HIGH SPEED DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 1990-08-28 US disclosed
US-4923783-A Containing high boiling solvent FUJI PHOTO FILM CO., LTD. (JP) 1990-05-08 US disclosed
US-4865962-A Photographic light-sensitive material and method of developing the same FUJI PHOTO FILM CO., LTD. (JP) 1989-09-12 US disclosed