SCHEMBL960030

SCHEMBL960030

CO[Si](C)(CCCNc1cccc(N)c1)OC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 1/20 0.40
MTNR1B P49286 1/20 0.40
ALDH1A1 P00352 4/20 0.39
CYP3A4 P08684 2/20 0.39
MAPT P10636 5/20 0.38
MEN1 O00255 2/20 0.38
LMNA P02545 2/20 0.38
GAA P10253 2/20 0.38
KMT2A Q03164 2/20 0.38
HTT P42858 2/20 0.38
KDM4E B2RXH2 1/20 0.38
GFER P55789 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
RET P07949 1/20 0.36
KDR P35968 1/20 0.36
DDX3X O00571 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL959868 0.87 MTNR1A (0.43) MTNR1AMTNR1BALDH1A1CYP3A4MAPT
Hydrochloric Acid SCHEMBL9159346 0.81 HTR7 (0.42) MTNR1AMTNR1BALDH1A1CYP3A4MAPT
SCHEMBL49467 0.81 MAPT (0.55) MTNR1AMTNR1BALDH1A1CYP3A4MAPT
Hydrochloric Acid SCHEMBL31327345 0.80 MAPT (0.53) ALDH1A1CYP3A4MAPTGAACYP1A2
SCHEMBL9759867 0.78 ALDH1A1 (0.41) MTNR1AMTNR1BALDH1A1CYP3A4MAPT
SCHEMBL15361088 0.76 MAPT (0.53) ALDH1A1CYP3A4MAPTLMNAGAA
SCHEMBL8168701 0.76 F2R (0.47) ALDH1A1CYP3A4MAPTMEN1LMNA
SCHEMBL9759574 0.75 NQO2 (0.41) ALDH1A1CYP3A4MAPTLMNAHTT
SCHEMBL31687255 0.75 MAPT (0.52) MTNR1AMTNR1BALDH1A1CYP3A4MAPT
SCHEMBL3218044 0.74 KCNH3 (0.45) MTNR1AMTNR1BALDH1A1CYP3A4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
EP-3125323-A1 SOLAR CELL Fujifilm Corporation (JP) 2017-02-01 EP disclosed
US-20170005282-A1 SOLAR CELL FUJIFILM CORPORATION (JP) 2017-01-05 US disclosed
US-20140069488-A1 CONDUCTIVE MEMBER, METHOD OF PRODUCING THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-03-13 US disclosed
US-20140048131-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-4997860-A Amino-substituted silanediol or silanetriol TOSHIBA SILICONE CO., LTD. (JP) 1991-03-05 US disclosed