SCHEMBL960399

SCHEMBL960399

CO[Si](C)(CCCNC(C)=O)OC

nearest known ligand 0.54

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.54
MAPK1 P28482 1/20 0.54
HIF1A Q16665 1/20 0.54
PAOX Q6QHF9 3/20 0.45
ADRA1A P35348 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.41
TSHR P16473 1/20 0.40
ALDH1A1 P00352 1/20 0.39
MTNR1A P48039 5/20 0.38
MTNR1B P49286 5/20 0.38
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16412053 0.85 EPHX1 (0.45) KDM4EMAPK1HIF1ATSHR
SCHEMBL16613121 0.83 EPHX1 (0.35) KDM4EMAPK1HIF1AADRA1ATSHR
SCHEMBL12909377 0.83 KDM4E (0.54) KDM4EMAPK1HIF1APAOXADRA1A
SCHEMBL3475797 0.83 EPHX1 (0.53) TSHR
SCHEMBL114474 0.82 EPHX1 (0.34) KDM4EMAPK1HIF1APAOXTSHR
SCHEMBL170046 0.81 ALDH1A1 (0.39) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL960689 0.81 KDM4E (0.56) KDM4EMAPK1HIF1APAOXADRA1A
SCHEMBL16422336 0.80 TSHR (0.40) KDM4EMAPK1HIF1ATSHRALDH1A1
SCHEMBL2616729 0.80 KDM4E (0.50) KDM4EMAPK1HIF1APAOXADRA1A
SCHEMBL17133244 0.80 KEAP1 (0.42) TSHRMTNR1AMTNR1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
US-11697754-B2 Thermal conductive layer, photosensitive layer, photosensitive composition, manufacturing method for thermal conductive layer, and laminate and semiconductor device FUJIFILM CORPORATION (JP) 2023-07-11 US disclosed
US-11697754-B2 Thermal conductive layer, photosensitive layer, photosensitive composition, manufacturing method for thermal conductive layer, and laminate and semiconductor device FUJIFILM CORPORATION (JP) 2023-07-11 US disclosed
US-11518833-B2 Composition, film, near infrared cut filter, laminate, pattern forming method, solid image pickup element, image display device, infrared sensor, and color filter FUJIFILM CORPORATION (JP) 2022-12-06 US disclosed
US-11236215-B2 Curable composition, cured film, optical filter, laminate, solid image pickup element, image display device, and infrared sensor FUJIFILM CORPORATION (JP) 2022-02-01 US disclosed
US-11209582-B2 Composition, curable composition, cured film, near infrared cut filter, infrared transmitting filter, solid image pickup element, infrared sensor, and camera module FUJIFILM CORPORATION (JP) 2021-12-28 US disclosed
US-11209732-B2 Near infrared absorbing composition, film, infrared cut filter, solid image pickup element, infrared absorber, and compound FUJIFILM CORPORATION (JP) 2021-12-28 US disclosed
US-11118059-B2 Film, film forming method, optical filter, laminate, solid image pickup element, image display device, and infrared sensor FUJIFILM CORPORATION (JP) 2021-09-14 US disclosed
US-11045834-B2 Method for producing film FUJIFILM CORPORATION (JP) 2021-06-29 US disclosed
US-20210139708-A1 COMPOSITION, FILM, NEAR INFRARED CUT FILTER, LAMINATE, PATTERN FORMING METHOD, SOLID IMAGE PICKUP ELEMENT, IMAGE DISPLAY DEVICE, INFRARED SENSOR, AND COLOR FILTER FUJIFILM CORPORATION (JP) 2021-05-13 US disclosed
US-8182968-B2 Color filter and method for producing the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-8158307-B2 Forming first color pattern in repeating pattern on substrate; forming second color pattern on substrate; removal by dry etching; forming third color pattern FUJIFILM CORPORATION (JP) 2012-04-17 US disclosed
US-20110028587-A1 CURABLE COMPOSITION, COLOR FILTER AND PROCESS FOR PRODUCTION THEREOF, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20110028587-A1 CURABLE COMPOSITION, COLOR FILTER AND PROCESS FOR PRODUCTION THEREOF, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20110012074-A1 LASER PROTECTION POLYMERIC MATERIALS OXAZOGEN INC. (US) 2011-01-20 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-20080286665-A1 COLOR FILTER AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2008-11-20 US disclosed
US-20080206659-A1 COLOR FILTER AND METHOD OF MANUFACTURING THE SAME, AND SOLID-STATE IMAGE PICKUP ELEMENT FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11209732-B2 Near infrared absorbing composition, film, infrared cut filter, solid image pickup element, infrared absorber, and compound ASH2L, RFT1, STRA6 KDM4E 4161/4885MAPK1 4540/4885HIF1A 2114/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.