SCHEMBL9619637

SCHEMBL9619637

C=C(C)C(=O)OCc1ccc(C(C)C)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.49
RXRA P19793 1/20 0.48
RXRB P28702 1/20 0.48
TSHR P16473 1/20 0.46
KMT2A Q03164 2/20 0.43
MEN1 O00255 1/20 0.43
LMNA P02545 1/20 0.43
NPC1 O15118 4/20 0.41
RAB9A P51151 4/20 0.41
KDM4E B2RXH2 1/20 0.41
POLB P06746 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
ALDH1A1 P00352 2/20 0.41
NPBWR1 P48145 1/20 0.40
MCHR1 Q99705 1/20 0.40
EGFR P00533 1/20 0.40
HRH3 Q9Y5N1 1/20 0.39
ACACB O00763 1/20 0.39
PDK2 Q15119 1/20 0.39
GRIN2B Q13224 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Peroxide SCHEMBL9619893 0.98 RXRA (0.50) IDO1RXRARXRBTSHRKMT2A
SCHEMBL254038 0.88 ALDH1A1 (0.50) TSHRKMT2AMEN1POLBL3MBTL1
SCHEMBL10033534 0.86 NPC1 (0.45) RXRARXRBTSHRKMT2AMEN1
SCHEMBL146557 0.84 THRB (0.45) IDO1RXRARXRBTSHRKMT2A
SCHEMBL24507793 0.83 TSHR (0.50) TSHRLMNA
SCHEMBL13784592 0.83 CA1 (0.41) RXRARXRBTSHRKMT2AMEN1
SCHEMBL9817853 0.83 ALDH1A1 (0.43) TSHRKMT2AMEN1LMNAPOLB
SCHEMBL451264 0.83 NPSR1 (0.50) IDO1KMT2AMEN1RAB9APOLB
SCHEMBL873057 0.82 ALDH1A1 (0.60) IDO1RXRARXRBKMT2AMEN1
SCHEMBL17791311 0.82 ALDH1A1 (0.46) TSHRKMT2AMEN1KDM4EPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240384227-A1 MATERIALS CHEMISTRIES AND MICROTOPOGRAPHIES AND USES THEREOF THE UNIVERSITY OF NOTTINGHAM (GB) 2024-11-21 US disclosed
US-20100112474-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
US-7563917-B2 Silicon compound and a production process for silicon compound CHISSO CORPORATION (JP) 2009-07-21 US disclosed
EP-0250090-B1 STORAGE STABLE LATENTLY CURABLE ACRYLIC FORMULATIONS EMPLOYING POLYMERIC HYDROPEROXIDES LOCTITE CORPORATION (US) 1992-01-29 EP disclosed
EP-0250090-A2 Storage stable latently curable acrylic formulations employing polymeric hydroperoxides LOCTITE CORPORATION (US) 1987-12-23 EP disclosed
US-4710500-A 1-(4'-fluorophenyl)-3,5-substituted indoles useful in the treatment of psychic disorders and pharmaceutical compositions thereof H. LUNDBECK A/S (DK) 1987-12-01 US disclosed
US-4681833-A LITHOGRAPHIC PRINTING PLATE SOMAR CORPORATION (JP) 1987-07-21 US disclosed
US-4427760-A GRAFT POLYMER OF MONOESTER OF VINYLAROMATICMALEIC ANHYDRIDE COPOLYMER AND GLYCIDYL MONOMER SOMAR MANUFACTURING CO. LTD. (JP) 1984-01-24 US disclosed