Water

Water

SCHEMBL9634089

O.O=N[Ru]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL5079118 0.94
SCHEMBL3084255 0.93
Hydrochloric Acid SCHEMBL5852756 0.86
Hydrochloric Acid SCHEMBL9551889 0.86
Hydrochloric Acid SCHEMBL4659515 0.86
Hydrochloric Acid SCHEMBL9551867 0.57
Water SCHEMBL31560454 0.57
Nitrous Acid SCHEMBL2781743 0.57
Nitrous Acid SCHEMBL249421 0.57
Water SCHEMBL29132036 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112142127-B Method for preparing ruthenium nitrosyl nitrate solution 中国船舶重工集团公司第七一八研究所 2022-07-15 CN disclosed
CN-109110828-B Method for efficiently preparing solid ruthenium nitrosyl nitrate 中国船舶重工集团公司第七一八研究所 2021-04-13 CN disclosed
CN-112142127-A Method for preparing ruthenium nitrosyl nitrate solution 中国船舶重工集团公司第七一八研究所 2020-12-29 CN disclosed
CN-111235395-A Method for recovering ruthenium from ruthenium-containing solution 康纳新型材料(杭州)有限公司 2020-06-05 CN disclosed
EP-2823900-B1 METHOD FOR PREPARING SOLID NITROSYL RUTHENIUM NITRATE BY USING WASTE CATALYST CONTAINING RUTHENIUM SUNSHINE KAIDI NEW ENERGY GROUP CO LTD (CN) 2017-05-17 EP disclosed
US-9005555-B2 Method for preparing solid ruthenium nitrosyl nitrate SUNSHINE KAIDI NEW ENERGY GROUP CO., LTD. (CN) 2015-04-14 US disclosed
EP-2823900-A1 METHOD FOR PREPARING SOLID NITROSYL RUTHENIUM NITRATE BY USING WASTE CATALYST CONTAINING RUTHENIUM Sunshine Kaidi New Energy Group Co., Ltd (CN) 2015-01-14 EP disclosed
US-20140369905-A1 METHOD FOR PREPARING SOLID RUTHENIUM NITROSYL NITRATE SUNSHINE KAIDI NEW ENERGY GROUP CO., LTD. (CN) 2014-12-18 US disclosed
CN-100490114-C Semiconductor structure, and method for forming a copper diffusion barrier INTEL CORP (US) 2009-05-20 CN disclosed
CN-1708845-A Forming a copper diffusion barrier INTEL CORP (US) 2005-12-14 CN disclosed
EP-0263694-B1 PROCESS FOR REMOVING RADIOACTIVE RUTHENIUM FROM AQUEOUS SOLUTION Motojima, Kenji (JP) 1992-05-20 EP disclosed
US-4938895-A Process for removing radioactive ruthenium from aqueous solution WARMATH, HERBERT, 1990-07-03 US disclosed
EP-0263694-A2 Process for removing radioactive ruthenium from aqueous solution Motojima, Kenji (JP) 1988-04-13 EP disclosed