SCHEMBL9681734

SCHEMBL9681734

COc1ccc(C(=O)C2(N3CCOCC3)CCCCC2)cc1

nearest known ligand 0.54

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.54
CYP2C19 P33261 1/20 0.54
ALDH1A1 P00352 3/20 0.50
MAPT P10636 2/20 0.50
USP2 O75604 1/20 0.50
ALOX12 P18054 1/20 0.50
KMT2A Q03164 2/20 0.48
MEN1 O00255 1/20 0.48
KDM4E B2RXH2 1/20 0.48
LMNA P02545 1/20 0.48
HPGD P15428 3/20 0.47
POLB P06746 3/20 0.47
SMN1; SMN2 Q16637 1/20 0.46
FKBP1A P62942 1/20 0.46
AKR1C3 P42330 1/20 0.46
BLM P54132 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10456871 0.99 CYP3A4 (0.55) CYP3A4CYP2C19ALDH1A1MAPTUSP2
SCHEMBL10458477 0.93 ALDH1A1 (0.53) CYP3A4CYP2C19ALDH1A1MAPTUSP2
SCHEMBL10456898 0.93 ALDH1A1 (0.53) CYP3A4CYP2C19ALDH1A1MAPTUSP2
SCHEMBL18883176 0.93 CYP3A4 (0.48) CYP3A4CYP2C19ALDH1A1MAPTUSP2
SCHEMBL10458501 0.88 CYP3A4 (0.48) CYP3A4CYP2C19ALDH1A1MAPTUSP2
SCHEMBL10458478 0.87 FKBP1A (0.51) CYP2C19ALDH1A1MAPTUSP2KMT2A
SCHEMBL10458636 0.85 THRB (0.44) CYP3A4CYP2C19ALDH1A1MAPTKMT2A
SCHEMBL9681006 0.84 KMT2A (0.39) CYP3A4CYP2C19ALDH1A1MAPTUSP2
SCHEMBL10458820 0.84 HRH3 (0.46) ALDH1A1MAPTKMT2AKDM4ELMNA
SCHEMBL12013268 0.83 LMNA (0.43) CYP3A4CYP2C19ALDH1A1MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8278387-B2 Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2012-10-02 US disclosed
US-7739789-B2 Method for forming surface graft, conductive film and metal patterns FUJIFILM CORPORATION (JP) 2010-06-22 US disclosed
US-20090246469-A1 RESIN COMPOSITION FOR LASER ENGRAVING, IMAGE FORMING MATERIAL, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND METHOD OF MANUFACTURING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-7416835-B2 Polymerizable composition FUJIFILM CORPORATION (JP) 2008-08-26 US disclosed
US-20070212883-A1 Method For Forming Surface Graft, Method For Forming Conductive Film, Method For Forming Method Pattern, Method For Forming Multilayer Wiring Board, Surface Graft Material, And Conductive Material FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-7232644-B2 Polymerizable composition and negative-working planographic printing plate precursor using the same FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-5145885-A Morpholine compound, binders CIBA-GEIGY CORPORATION (US) 1992-09-08 US disclosed
EP-0269573-B1 LIQUID PHOTOINITIATING MIXTURE CIBA-GEIGY AG (CH) 1991-03-27 EP disclosed
US-4992547-A Aminoaryl ketone photoinitiators CIBA-GEIGY CORPORATION (US) 1991-02-12 US disclosed
US-4960746-A A-HYDROXY-OR A-AMINO-ACETOPHENONES AND A TITANOCENE COMPOUND SUBSTITUTED BY FLUORINE CIBA-GEIGY CORPORATION (US) 1990-10-02 US disclosed
US-4900823-A PHOTOINITIATORS FOR PHOTOCURING CIBA-GEIGY CORPORATION (US) 1990-02-13 US disclosed
EP-0138754-B1 PHOTOCURABLE COMPOSITIONS CIBA-GEIGY AG (CH) 1988-05-25 EP disclosed
US-4739052-A PHOTOINITIATORS CIBA-GEIGY CORPORATION (US) 1988-04-19 US disclosed
US-4559371-A FOR PRINTING INKS AND PAINTS CIBA GEIGY CORPORATION (US) 1985-12-17 US disclosed