SCHEMBL9720829

SCHEMBL9720829

Sc1cccc2scnc12

nearest known ligand 0.45

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.45
HSD17B10 Q99714 1/20 0.45
PSMD14 O00487 3/20 0.42
COPS5 Q92905 3/20 0.42
PRMT5 O14744 1/20 0.33
NAMPT P43490 1/20 0.32
P4HB P07237 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL9304849 0.98 ALDH1A1 (0.43) ALDH1A1HSD17B10PSMD14COPS5PRMT5
Phenol SCHEMBL28809498 0.78 HSD17B1 (0.33) ALDH1A1HSD17B10
SCHEMBL10883913 0.74 ALDH1A1 (0.45) ALDH1A1HSD17B10PRMT5NAMPT
SCHEMBL288904 0.74 ALDH1A1 (0.46) ALDH1A1HSD17B10NAMPT
SCHEMBL2682744 0.74 ALDH1A1 (0.45) ALDH1A1HSD17B10PRMT5NAMPT
SCHEMBL926998 0.74 LMNA (0.46) ALDH1A1HSD17B10NAMPT
SCHEMBL2088376 0.74 ALDH1A1 (0.45) ALDH1A1HSD17B10PRMT5NAMPTP4HB
SCHEMBL197613 0.74 ALDH1A1 (0.45) ALDH1A1HSD17B10PRMT5NAMPT
SCHEMBL288903 0.74 ALDH1A1 (0.45) ALDH1A1HSD17B10PRMT5NAMPT
SCHEMBL744132 0.74 SMN1; SMN2 (0.46) ALDH1A1HSD17B10P4HB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117778119-A Cleaning agent for chip after chemical mechanical polishing and preparation method and application thereof 江苏奥首材料科技有限公司 2024-03-29 CN claimed
CN-113151837-B Preparation method of cleaning solution after chemical mechanical polishing 上海新阳半导体材料股份有限公司 2022-08-05 CN claimed
CN-113186541-B Application of post-chemical mechanical polishing cleaning solution 上海新阳半导体材料股份有限公司 2022-08-02 CN claimed
CN-113201742-A Application of post-chemical mechanical polishing cleaning solution 上海新阳半导体材料股份有限公司 2021-08-03 CN claimed
CN-113186540-A Post-chemical mechanical polishing cleaning solution 上海新阳半导体材料股份有限公司 2021-07-30 CN claimed
CN-113186539-A Post-chemical mechanical polishing cleaning solution and preparation method thereof 上海新阳半导体材料股份有限公司 2021-07-30 CN claimed
CN-113186541-A Application of post-chemical mechanical polishing cleaning solution 上海新阳半导体材料股份有限公司 2021-07-30 CN claimed
CN-113151837-A Preparation method of cleaning solution after chemical mechanical polishing 上海新阳半导体材料股份有限公司 2021-07-23 CN claimed
CN-109988676-A A kind of cleaning solution, preparation method and application 上海新阳半导体材料股份有限公司 2019-07-09 CN claimed
US-20140235548-A1 COMPOSITIONS AND METHODS FOR JAMM PROTEIN INHIBITION CLEAVE BIOSCIENCES, INC. (US) 2014-08-21 US claimed
EP-2710119-A1 COMPOSITIONS AND METHODS FOR JAMM PROTEIN INHIBITION Cleave Biosciences, Inc. (US) 2014-03-26 EP claimed
WO-2012158435-A1 COMPOSITIONS AND METHODS FOR JAMM PROTEIN INHIBITION ZHOU HAN-JIE (US) 2012-11-22 WO claimed
CN-117778119-A Cleaning agent for chip after chemical mechanical polishing and preparation method and application thereof 江苏奥首材料科技有限公司 2024-03-29 CN disclosed
CN-113201742-B Application of post-chemical mechanical polishing cleaning solution 上海新阳半导体材料股份有限公司 2022-12-30 CN disclosed
CN-113186539-B Post-chemical mechanical polishing cleaning solution and preparation method thereof 上海新阳半导体材料股份有限公司 2022-12-06 CN disclosed
CN-113186540-B Post-chemical mechanical polishing cleaning solution 上海新阳半导体材料股份有限公司 2022-08-23 CN disclosed
US-5141978-A PROCESSING OF POLYURETHANE RUBBERS RHEIN CHEMIE RHEINAU GMBH (DE) 1992-08-25 US disclosed
US-4453988-A Coatings for rusted metallic surfaces GROW GROUP, INC. (US) 1984-06-12 US disclosed
US-4061612-A Low temperature plasticizers for specialty rubbers consisting of diesters of dicarboxylic acids with hexyloxyethoxyethanol or butoxyethoxyethoxyethanol THIOKOL CORPORATION (US) 1977-12-06 US disclosed
US-3962273-A NOVEL METHOD FOR THE SYNTHESIS OF 4-THIO AND 4-SELENO ETHERS OF 2-PYRAZOLIN-5-ONES EASTMAN KODAK COMPANY (US) 1976-06-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140235548-A1 COMPOSITIONS AND METHODS FOR JAMM PROTEIN INHIBITION USP24, USP36, USP39 ALDH1A1 4211/4885HSD17B10 3546/4885PSMD14 7/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.