SCHEMBL9728462

SCHEMBL9728462

COC(=O)Oc1ccc(CSCc2ccccc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.52
LMNA P02545 2/20 0.52
HTT P42858 2/20 0.52
L3MBTL1 Q9Y468 2/20 0.47
ACE P12821 2/20 0.46
EPHX1 P07099 1/20 0.46
GAA P10253 3/20 0.46
NPC1 O15118 3/20 0.46
TAAR1 Q96RJ0 1/20 0.46
MAPT P10636 2/20 0.45
CYP2C19 P33261 1/20 0.45
KDM4E B2RXH2 1/20 0.45
PPARG P37231 1/20 0.44
PPARA Q07869 1/20 0.44
CYP1A2 P05177 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20421985 0.94 HTT (0.48) RAB9ALMNAHTTL3MBTL1ACE
SCHEMBL31038960 0.89 HTT (0.44) RAB9ALMNAHTTL3MBTL1ACE
SCHEMBL9220921 0.88 LMNA (0.49) RAB9ALMNAHTTL3MBTL1ACE
Trifluoromethanesulfonic Acid SCHEMBL20421987 0.88 HTT (0.44) RAB9ALMNAHTTL3MBTL1ACE
SCHEMBL28697234 0.86 ALDH1A1 (0.54) LMNAHTTL3MBTL1MAPTCYP2C19
SCHEMBL9222914 0.84 LMNA (0.50) RAB9ALMNAHTTL3MBTL1NPC1
SCHEMBL28697235 0.83 MEN1 (0.45) RAB9ALMNAHTTL3MBTL1GAA
SCHEMBL28973261 0.83 ELANE (0.56) RAB9ALMNAHTTGAANPC1
SCHEMBL1127804 0.81 RAB9A (0.49) RAB9ALMNAHTTEPHX1GAA
Acetic Acid Methyl Ester SCHEMBL23070551 0.79 CYP2C19 (0.53) RAB9ALMNAHTTL3MBTL1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0331496-B1 POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1992-09-16 EP claimed
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed
CN-115190891-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-10-15 CN disclosed
CN-114981360-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-09-10 CN disclosed
CN-115667404-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
CN-111234180-B Resin composition and hardened resin composition 财团法人工业技术研究院 2022-06-14 CN disclosed
US-20200165481-A1 Resin composition and cured resin composition INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2020-05-28 US disclosed
US-10059803-B2 Resin containing oxetane and epoxy groups and resin composition including the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2018-08-28 US disclosed
EP-3339023-A1 LAMINATE, METHOD FOR MANUFACTURING LAMINATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE FUJI-FILM Corporation (JP) 2018-06-27 EP disclosed
EP-3339352-A1 RESIN, COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2018-06-27 EP disclosed
US-20160145387-A1 RESIN CONTAINING OXETANE AND EPOXY GROUPS AND RESIN COMPOSITION INCLUDING THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2016-05-26 US disclosed
EP-0331496-B1 POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1992-09-16 EP disclosed
EP-0331496-A1 Polyfluoride sulfonium compounds and polymerization initiator thereof SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1989-09-06 EP disclosed