SCHEMBL974500

SCHEMBL974500

CCCC(O)NCCCCN

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
GNAI3 P08754 1/20 0.45
GNAO1 P09471 1/20 0.45
GNAI1 P63096 1/20 0.45
DNM1 Q05193 8/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
ALDH1A1 P00352 1/20 0.42
TSHR P16473 1/20 0.42
EPHX1 P07099 1/20 0.42
DPP7 Q9UHL4 1/20 0.41
SIRT6 Q8N6T7 1/20 0.41
SIRT1 Q96EB6 1/20 0.41
RRM1 P23921 1/20 0.40
TLR2 O60603 1/20 0.37
PAOX Q6QHF9 1/20 0.36
SPHK1 Q9NYA1 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22806820 0.98 GNAI3 (0.47) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL976799 0.94 DNM1 (0.39) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL22806617 0.92 GNAI3 (0.45) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL22806603 0.90 GNAI3 (0.51) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL13374807 0.90 GNAI3 (0.47) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL22806604 0.88 GNAI3 (0.54) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL12321608 0.88 GNAI3 (0.45) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL4938031 0.87 ALDH1A1 (0.43) MEN1KMT2AALDH1A1TSHREPHX1
SCHEMBL18176003 0.85 DPP7 (0.50) GNAI3GNAO1GNAI1DNM1MEN1
SCHEMBL8389662 0.85 CA12 (0.40) GNAI3GNAO1GNAI1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3144371-B1 HYDROXYALKYL SUBSTITUTED SUCCINIMIDES AND FUELS CONTAINING THEM AFTON CHEMICAL CORP (US) 2021-10-06 EP claimed
US-20150296646-A1 PROTECTIVE PLATE AND DISPLAY DEVICE SHARP KABUSHIKI KAISHA (JP) 2015-10-15 US disclosed
US-8790990-B2 Silica-based film forming material for formation of air gaps, and method for forming air gaps TOKYO OHKA KOGYO CO., LTD. (JP) 2014-07-29 US disclosed
US-8404786-B2 Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same JSR CORPORATION (JP) 2013-03-26 US disclosed
EP-1705208-B1 COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM, AND METHOD FOR FORMING SAME JSR CORP (JP) 2013-03-20 EP disclosed
US-8318582-B2 Method of forming a trench isolation JSR CORPORATION (JP) 2012-11-27 US disclosed
US-20110189833-A1 SILICA-BASED FILM FORMING MATERIAL FOR FORMATION OF AIR GAPS, AND METHOD FOR FORMING AIR GAPS TOKYO OHKA KOGYO CO., LTD. (JP) 2011-08-04 US disclosed
US-7939590-B2 Composition for forming silica-based coating film TOKYO OHKA KOGYO CO., LTD. (JP) 2011-05-10 US disclosed
US-20110077364-A1 COMPOSITION CONTAINING SILICON-CONTAINING POLYMER, CURED PRODUCT OF THE COMPOSITION, SILICON-CONTAINING POLYMER, AND METHOD OF PRODUCING THE SILICON-CONTAINING POLYMER JSR CORPORATION (JP) 2011-03-31 US disclosed
US-20110053340-A1 METHOD OF FORMING A TRENCH ISOLATION JSR CORPORATION (JP) 2011-03-03 US disclosed
US-6410151-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed
EP-0143396-B1 CRYSTALLITE SUSPENSIONS OF CRYSTALLINE, ETHYLENICALLY UNSATURATED POLYESTERS AND POLYHYDROXYL COMPOUNDS, PROCESS FOR THEIR PREPARATION AND THEIR USE IN PREPARATING POLYURETHANES OR POLYMERS CONTAINING POLYURETHANE GROUPS BASF Aktiengesellschaft (DE) 1991-03-13 EP disclosed
EP-0115072-B1 ADDITION PRODUCTS FROM OLEFINICALLY UNSATURATED POLYESTER-POLYOLS AND ALKYLENE POLYAMINES, PROCESS FOR THEIR PREPARATION ANALOGOUS TO THE MICHAEL-REACTION, THEIR USE AS AN ADDITIVE FOR SYNTHETIC RESINS ON ISOCYANATE BASE AND FOR THE PREPARATION OF POLYISOCYANURATE FOAMS CONTAINING POLYURETHANE GROUPS BASF Aktiengesellschaft (DE) 1986-07-16 EP disclosed
EP-0143396-A2 Crystallite suspensions of crystalline, ethylenically unsaturated polyesters and polyhydroxyl compounds, process for their preparation and their use in preparating polyurethanes or polymers containing polyurethane groups BASF Aktiengesellschaft (DE) 1985-06-05 EP disclosed
EP-0115072-A1 Addition products from olefinically unsaturated polyester-polyols and alkylene polyamines, process for their preparation analogous to the Michael-reaction, their use as an additive for synthetic resins on isocyanate base and for the preparation of polyisocyanurate foams containing polyurethane groups BASF Aktiengesellschaft (DE) 1984-08-08 EP disclosed
US-4051155-A Anthraquinone dyes ALLIED CHEMICAL CORPORATION (US) 1977-09-27 US disclosed