Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1548272 | 0.84 | FDPS (0.38) | FDPSTDP1CA1CA2 | |
| SCHEMBL976818 | 0.84 | MMP1 (0.35) | LMNACA12CA1CA2CA9 | |
| SCHEMBL28056858 | 0.84 | MAPT (0.39) | LMNATSHR | |
| SCHEMBL161251 | 0.84 | FDPS (0.38) | FDPSLMNA | |
| SCHEMBL3934566 | 0.82 | GPR84 (0.40) | FDPSLMNA | |
| SCHEMBL4929903 | 0.82 | DNM1 (0.44) | LMNACA12CA1CA2CA9 | |
| SCHEMBL162073 | 0.80 | ALDH1A1 (0.38) | FDPSLMNATSHR | |
| SCHEMBL9329956 | 0.80 | GPR84 (0.43) | FDPSLMNA | |
| SCHEMBL3932582 | 0.80 | GPR84 (0.43) | FDPSLMNA | |
| SCHEMBL23888720 | 0.80 | DNM1 (0.48) | LMNACA12CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116284172-A | Surfactant with antioxidant function and preparation method and application thereof | 南京工业大学 | 2023-06-23 | — | — | CN | claimed |
| US-10113049-B2 | Thermoplastic resin composition | NIPPON NYUKAZAI CO., LTD. (JP) | 2018-10-30 | — | — | US | claimed |
| US-20150329698-A1 | THERMOPLASTIC RESIN COMPOSITION | NIPPON NYUKAZAI CO., LTD. (JP) | 2015-11-19 | — | — | US | claimed |
| US-20080066644-A1 | Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-20 | — | — | US | claimed |
| EP-1900785-A1 | Ink Composition for Inkjet Recording | Samsung Electronics Co., Ltd. (KR) | 2008-03-19 | — | — | EP | claimed |
| EP-0122151-B1 | PRODUCTION OF PRIMARY OR SECONDARY ALCOHOL DERIVATIVES OF PHOSPHOLIPIDS BY THE ENZYMATIC TECHNIQUE | MEITO SANGYO KABUSHIKI KAISHA (JP) | 1989-02-15 | — | — | EP | claimed |
| EP-4127118-B1 | WATER-GLYCOL HYDRAULIC FLUID COMPOSITION AND SUPPLEMENTARY ADDITIVE THEREFOR | SHELL INT RESEARCH (NL) | 2023-12-06 | — | — | EP | disclosed |
| CN-109890360-B | Methods, compositions and uses related thereto | 因诺斯佩克有限公司 | 2023-11-21 | — | — | CN | disclosed |
| CN-109789065-B | Cosmetic composition for combating colour loss of dyed material | 因诺斯佩克有限公司 | 2023-11-21 | — | — | CN | disclosed |
| CN-109789064-B | Methods, compositions and uses related thereto | 因诺斯佩克有限公司 | 2023-11-21 | — | — | CN | disclosed |
| CN-109789319-B | Reduction of color loss from dyed materials by using amine salts of carboxylic acids | 因诺斯佩克有限公司 | 2023-09-29 | — | — | CN | disclosed |
| EP-3518874-B1 | METHODS, COMPOSITIONS AND USES RELATING THERETO | INNOSPEC LTD (GB) | 2023-08-16 | — | — | EP | disclosed |
| CN-116284172-A | Surfactant with antioxidant function and preparation method and application thereof | 南京工业大学 | 2023-06-23 | — | — | CN | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| US-4438235-A | POLYETHERS, POLYESTERS, POLYURETHANES | BASF WYANDOTTE CORPORATION (US) | 1984-03-20 | — | — | US | disclosed |