Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.68 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.68 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.68 |
| ▸ | CA1 | P00915 | 4/20 | 0.62 |
| ▸ | CA2 | P00918 | 4/20 | 0.62 |
| ▸ | CA12 | O43570 | 3/20 | 0.62 |
| ▸ | CA3 | P07451 | 3/20 | 0.62 |
| ▸ | CA4 | P22748 | 3/20 | 0.62 |
| ▸ | CA6 | P23280 | 3/20 | 0.62 |
| ▸ | CA5A | P35218 | 3/20 | 0.62 |
| ▸ | CA7 | P43166 | 3/20 | 0.62 |
| ▸ | CA9 | Q16790 | 3/20 | 0.62 |
| ▸ | CA13 | Q8N1Q1 | 3/20 | 0.62 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.62 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.62 |
| ▸ | MMP2 | P08253 | 2/20 | 0.54 |
| ▸ | MEN1 | O00255 | 1/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.54 |
| ▸ | MMP1 | P03956 | 1/20 | 0.54 |
| ▸ | MMP9 | P14780 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9412338 | 0.89 | ALDH1A1 (0.56) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL10191888 | 0.87 | ALDH1A1 (0.54) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL4848781 | 0.87 | BCHE (0.55) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL6392077 | 0.82 | PKM (0.59) | ALDH1A1MAPK1CA1CA2MMP2 | |
| SCHEMBL6743839 | 0.82 | CNR2 (0.51) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL9313173 | 0.81 | ALDH1A1 (1.00) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL4328031 | 0.81 | ALDH1A1 (1.00) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL22742 | 0.81 | ALDH1A1 (1.00) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL2122579 | 0.81 | ALDH1A1 (1.00) | ALDH1A1CYP3A4MAPK1CA1CA2 | |
| SCHEMBL329872 | 0.79 | ALDH1A1 (0.65) | ALDH1A1CYP3A4MAPK1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9086623-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-9086623-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7163781-B2 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7162955-B2 | Lithographic printing method and printing press | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-7157205-B2 | Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-4997737-A | Contain sulfonyl group | EASTMAN KODAK COMPANY (US) | 1991-03-05 | — | — | US | disclosed |
| US-4948911-A | ELECTRON-TRANSPORT AGENTS | EASTMAN KODAK COMPANY (US) | 1990-08-14 | — | — | US | disclosed |