⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28202544 | 0.98 | DPP7 (0.35) | — | |
| SCHEMBL27349632 | 0.86 | SPHK1 (0.47) | — | |
| SCHEMBL976799 | 0.86 | DNM1 (0.39) | — | |
| SCHEMBL974500 | 0.85 | GNAI3 (0.45) | — | |
| SCHEMBL22806820 | 0.83 | GNAI3 (0.47) | — | |
| SCHEMBL975993 | 0.82 | — | — | |
| SCHEMBL13063340 | 0.81 | TSHR (0.37) | — | |
| SCHEMBL13707476 | 0.81 | — | — | |
| SCHEMBL976801 | 0.80 | TSHR (0.38) | — | |
| SCHEMBL1481696 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3144371-B1 | HYDROXYALKYL SUBSTITUTED SUCCINIMIDES AND FUELS CONTAINING THEM | AFTON CHEMICAL CORP (US) | 2021-10-06 | — | — | EP | claimed |
| CN-110214135-A | Indanyl Aminopyrazine basic ring propanecarboxylic acid, medical composition and its use | 勃林格殷格翰国际有限公司 | 2019-09-06 | — | — | CN | disclosed |
| US-20150296646-A1 | PROTECTIVE PLATE AND DISPLAY DEVICE | SHARP KABUSHIKI KAISHA (JP) | 2015-10-15 | — | — | US | disclosed |
| US-8790990-B2 | Silica-based film forming material for formation of air gaps, and method for forming air gaps | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8404786-B2 | Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same | JSR CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| EP-1705208-B1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM, AND METHOD FOR FORMING SAME | JSR CORP (JP) | 2013-03-20 | — | — | EP | disclosed |
| US-8318582-B2 | Method of forming a trench isolation | JSR CORPORATION (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20110189833-A1 | SILICA-BASED FILM FORMING MATERIAL FOR FORMATION OF AIR GAPS, AND METHOD FOR FORMING AIR GAPS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-08-04 | — | — | US | disclosed |
| US-7939590-B2 | Composition for forming silica-based coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-10 | — | — | US | disclosed |
| US-20110053340-A1 | METHOD OF FORMING A TRENCH ISOLATION | JSR CORPORATION (JP) | 2011-03-03 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-0005446-B1 | AMINO-ETHER AMPHOTERIC SURFACE-ACTIVE COMPOUNDS AND PROCESS FOR THEIR PREPARATION | Henkel Kommanditgesellschaft auf Aktien (DE) | 1982-09-15 | — | — | EP | disclosed |
| US-4223138-A | VAPORIZATION, CONDENSATION, RETARDING FLOW TO REACTION ZONE | BAYER AKTIENGESELLSCHAFT (DE) | 1980-09-16 | — | — | US | disclosed |
| US-4214102-A | SHAMPOO FORMULATIONS HAVING LOW IRRITATION TO EYES | HENKEL INC. (US) | 1980-07-22 | — | — | US | disclosed |
| EP-0005446-A1 | Amino-ether amphoteric surface-active compounds and process for their preparation | Henkel Kommanditgesellschaft auf Aktien (DE) | 1979-11-28 | — | — | EP | disclosed |