SCHEMBL978115

SCHEMBL978115

O=C1c2ccccc2-c2cc(-c3ccccc3)cc(-c3ccccc3)c21

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.60
MEN1 O00255 4/20 0.60
KMT2A Q03164 4/20 0.60
LMNA P02545 3/20 0.60
APAF1 O14727 2/20 0.60
NPC1 O15118 2/20 0.60
THRB P10828 2/20 0.60
HTT P42858 2/20 0.60
RAB9A P51151 2/20 0.60
GALK1 P51570 2/20 0.60
BLM P54132 2/20 0.60
SMN1; SMN2 Q16637 2/20 0.60
NPSR1 Q6W5P4 2/20 0.60
XBP1 P17861 1/20 0.60
PTBP1 P26599 1/20 0.60
SMAD3 P84022 1/20 0.60
ATM Q13315 1/20 0.60
L3MBTL1 Q9Y468 1/20 0.60
MAOA P21397 4/20 0.46
PTPRC P08575 3/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31510410 0.92 MEN1 (0.55) MAPTMEN1KMT2ALMNAAPAF1
SCHEMBL22730653 0.88 MAPT (0.59) MAPTMEN1KMT2ALMNAAPAF1
SCHEMBL978805 0.81 MAPT (0.57) MAPTMEN1KMT2ALMNAAPAF1
SCHEMBL19001705 0.78 MAPT (0.58) MAPTMEN1KMT2ALMNAAPAF1
SCHEMBL28937875 0.78 L3MBTL1 (0.62) MAPTMEN1KMT2ALMNAAPAF1
SCHEMBL3925899 0.78 ADORA2A (0.53) MAPTMEN1KMT2ALMNAAPAF1
SCHEMBL29595074 0.77 LMNA (0.59) MAPTMEN1KMT2ALMNAAPAF1
SCHEMBL1038974 0.77 ADORA2A (0.57) MAPTMEN1KMT2ALMNARAB9A
SCHEMBL19299407 0.77 LMNA (0.47) MAPTMEN1KMT2ALMNAAPAF1
Anthraquinone SCHEMBL28835137 0.76 MEN1 (0.60) MAPTMEN1KMT2ALMNAAPAF1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
CN-1942825-B Resist composition MITSUBISHI GAS CHEMICAL CO 2010-05-12 CN disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
CN-1942825-A Resist composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-04-04 CN disclosed
EP-1739485-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-03 EP disclosed