Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | WDR5 | P61964 | 1/20 | 0.53 |
| ▸ | LDHA | P00338 | 1/20 | 0.52 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.47 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.47 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.47 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.47 |
| ▸ | GLA | P06280 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 2/20 | 0.46 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 2/20 | 0.46 |
| ▸ | CDC25B | P30305 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31304979 | 1.00 | WDR5 (0.53) | WDR5LDHAAKR1C3ALDH1A1MEN1 | |
| SCHEMBL1666411 | 0.91 | WDR5 (0.49) | WDR5LDHAAKR1C3ALDH1A1MEN1 | |
| SCHEMBL27716376 | 0.91 | WDR5 (0.49) | WDR5LDHAAKR1C3ALDH1A1MEN1 | |
| SCHEMBL28375053 | 0.91 | WDR5 (0.49) | WDR5LDHAAKR1C3ALDH1A1MEN1 | |
| SCHEMBL12486587 | 0.91 | WDR5 (0.61) | WDR5LDHAAKR1C3ALDH1A1MEN1 | |
| SCHEMBL21815755 | 0.90 | WDR5 (0.47) | WDR5LDHAAKR1C3ALDH1A1MEN1 | |
| SCHEMBL425867 | 0.87 | ALDH1A1 (0.49) | WDR5LDHAALDH1A1MEN1KMT2A | |
| SCHEMBL8418472 | 0.86 | CYP1B1 (0.50) | WDR5LDHAMEN1KMT2AKDM4E | |
| SCHEMBL1666525 | 0.84 | KDM4E (0.47) | AKR1C3ALDH1A1MEN1KMT2AKDM4E | |
| SCHEMBL9807419 | 0.83 | LDHA (0.70) | WDR5LDHAMEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118580178-A | Method for synthesizing C-4 alkylpyridine by taking alcohol as alkylating reagent | 陕西师范大学 | 2024-09-03 | — | — | CN | claimed |
| JP-6234848-A | — | — | None | — | — | JP | disclosed |
| CN-118580178-A | Method for synthesizing C-4 alkylpyridine by taking alcohol as alkylating reagent | 陕西师范大学 | 2024-09-03 | — | — | CN | disclosed |
| CN-112218844-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-20240109997-A1 | RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-04 | — | — | US | disclosed |
| US-20230333469-A1 | FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-19 | — | — | US | disclosed |
| CN-116888181-A | Resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2023-10-13 | — | — | CN | disclosed |
| CN-111655662-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2023-09-26 | — | — | CN | disclosed |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| CN-115836045-A | Composition for forming photoresist, method for forming resist pattern, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2023-03-21 | — | — | CN | disclosed |
| CN-1606540-A | Synthesis and use of dimethyl 1,5-naphthalenedicarboxylates and intermediates therefrom | BP CORP NORTH AMERICA INC (US) | 2005-04-13 | — | — | CN | disclosed |
| EP-1368297-A2 | SYNTHESIS AND USE OF DIMETHYL-1,5-NAPHTHALENEDICARBOXYLATES AND INTERMEDIATES THEREFROM | BP Corporation North America Inc. (US) | 2003-12-10 | — | — | EP | disclosed |
| US-6495710-B2 | Synthesis and use of dimethyl 1,5-naphthalenedicarboxlyates and intermediates therefrom | BP CORPORATION NORTH AMERICA INC. | 2002-12-17 | — | — | US | disclosed |
| US-20010031852-A1 | Synthesis and use of dimethyl 1,5-naphthalenedicarboxylates and intermediates therefrom | BP CORPORATION NORTH AMERICA INC. | 2001-10-18 | — | — | US | disclosed |
| WO-2001051450-A2 | SYNTHESIS AND USE OF DIMETHYL-1,5-NAPHTHALENEDICARBOXYLATES AND INTERMEDIATES THEREFROM | BP CORPORATION NORTH AMERICA INC. (US) | 2001-07-19 | — | — | WO | disclosed |
| JP-H06234848-A | NEW DIBENZOYLNAPHTHALENE DERIVATIVE, POLYMER CONTAINING THE SAME DERIVATIVE AND ITS PRODUCTION | JAPAN ENERGY CORP | 1994-08-23 | — | — | JP | disclosed |
| EP-0391268-B1 | Manufacture of dyestuffs of the dibenzopyrenequinone series | HOECHST AG (DE) | 1994-02-09 | — | — | EP | disclosed |
| US-5126427-A | For stable solutions in halogenated hydrocarbons, solvent resistance, thermal poroperties, molding materials, coatings | CIBA-GEIGY CORPORATION (US) | 1992-06-30 | — | — | US | disclosed |
| EP-0391268-A1 | Manufacture of dyestuffs of the dibenzopyrenequinone series | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-10-10 | — | — | EP | disclosed |
| EP-0391268-A1 | Manufacture of dyestuffs of the dibenzopyrenequinone series | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-10-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | RER1, FEM1B, UNC119 | WDR5 393/4885LDHA 4223/4885AKR1C3 2524/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.