SCHEMBL9828137

SCHEMBL9828137

CC(OC(=O)NCCCC(=O)O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.56
OPRM1 P35372 3/20 0.49
ATM Q13315 1/20 0.49
FFAR1 O14842 1/20 0.47
HCAR2 Q8TDS4 1/20 0.45
KMT2A Q03164 2/20 0.45
MEN1 O00255 1/20 0.45
HIF1A Q16665 1/20 0.45
ALDH1A1 P00352 1/20 0.45
HPGD P15428 1/20 0.45
LMNA P02545 1/20 0.44
CYP3A4 P08684 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C19 P33261 1/20 0.43
HDAC3 O15379 1/20 0.43
HDAC4 P56524 1/20 0.43
HDAC1 Q13547 1/20 0.43
HDAC7 Q8WUI4 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC10 Q969S8 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9828186 0.96 HTT (0.52) HTTOPRM1ATMFFAR1KMT2A
SCHEMBL9831112 0.92 OPRM1 (0.50) HTTOPRM1FFAR1HCAR2
SCHEMBL11186607 0.91 OPRM1 (0.51) HTTOPRM1HCAR2ALDH1A1HPGD
SCHEMBL9308871 0.88 NAAA (0.51) HTTOPRM1KMT2AMEN1ALDH1A1
SCHEMBL21798492 0.85 EPHX2 (0.60) KMT2AALDH1A1HPGDCYP2D6CYP2C19
SCHEMBL10639479 0.84 OPRM1 (0.51) OPRM1HCAR2LMNA
SCHEMBL9293279 0.83 OPRM1 (0.50) HTTOPRM1HCAR2ALDH1A1HPGD
SCHEMBL17550883 0.83 OPRM1 (0.50) OPRM1HCAR2HPGDLMNA
Hydrochloric Acid SCHEMBL28345934 0.82 OPRM1 (0.49) OPRM1HCAR2HPGD
SCHEMBL9293791 0.81 OPRM1 (0.44) HTTOPRM1HCAR2ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9250518-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-02 US disclosed
US-9250518-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-02 US disclosed
US-20150125794-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-07 US disclosed
US-20150125794-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-07 US disclosed
US-9017922-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-9017922-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-20140080055-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-20 US disclosed
US-20140080055-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-20 US disclosed
EP-0226304-B1 COMPOSITION CONTAINING A PENEM OR CARBAPENEM ANTIBIOTIC SANKYO COMPANY LIMITED (JP) 1991-08-28 EP disclosed
US-4757066-A Reduces renal toxicity SANKYO COMPANY LIMITED (JP) 1988-07-12 US disclosed