SCHEMBL9837909

SCHEMBL9837909

Nc1cccc(C(c2cccc(Oc3ccccc3)c2C(c2cccc(N)c2O)(C(F)(F)F)C(F)(F)F)(C(F)(F)F)C(F)(F)F)c1O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.35
ALDH1A1 P00352 2/20 0.35
CTNNB1 P35222 1/20 0.33
BRD4 O60885 2/20 0.33
PTPN1 P18031 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
DPP4 P27487 1/20 0.32
HRH1 P35367 1/20 0.31
RCE1 Q9Y256 1/20 0.31
MAOB P27338 1/20 0.30
MAPT P10636 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
CDK1 P06493 1/20 0.30
CDK2 P24941 1/20 0.30
IKBKB O14920 1/20 0.30
BRAF P15056 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10555528 0.84 AR (0.36) GAAALDH1A1CTNNB1DPP4RIPK1
SCHEMBL30390082 0.78 MMP2 (0.39) GAAALDH1A1CYP3A4MAPTNPSR1
SCHEMBL6757407 0.78 MMP2 (0.39) GAAALDH1A1CYP3A4MAPTNPSR1
SCHEMBL8970417 0.76 MAOA (0.41) GAAALDH1A1CTNNB1PTPN1CYP1A2
SCHEMBL565289 0.74 GAA (0.49) GAAALDH1A1CTNNB1BRD4CYP1A2
SCHEMBL5426532 0.73 MAOB (0.38) GAAALDH1A1BRD4PTPN1CYP1A2
SCHEMBL14678335 0.73 GAA (0.45) GAAALDH1A1CTNNB1BRD4CYP1A2
SCHEMBL8173374 0.71 KDM4E (0.35) GAAALDH1A1CYP1A2CYP3A4CYP2C19
SCHEMBL721404 0.68 NCOA1 (0.49) GAAALDH1A1CYP3A4HRH1RCE1
SCHEMBL2835521 0.68 MAOB (0.51) GAAALDH1A1CYP3A4RCE1MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5011753-A Polyamides Containing Hexafluoroisopropylidene Groups Which May Be Cured To Form Polybenzoxazoles HOECHST CELANESE CORPORATION (US) 1991-04-30 US disclosed
US-4939215-A CHEMICAL AND RADIATION RESISTANCE; AIRCRAFT, ELECTRONICS HOECHST CELANESE CORPORATION (US) 1990-07-03 US disclosed
US-4845183-A MOLDING MATERIALS; FOR DIELECTRICS OR COATING SOLUTIONS; TOUGHNESS, FLEXIBILITY, TRANSPARENT HOECHST CELANESE CORPORATION (US) 1989-07-04 US disclosed